Masaya Nomura

Headspace gas chromatography analysis of uncombusted gasoline diluent in used gasoline engine oils

Abstract A method for analyzing the uncombusted gasoline diluent in used gasoline engine oils using a combination of headspace gas chromatography (GC) and PONA ( P araffins, Q lefins, N aphthenes and A romatics) analysis was studied. The gasoline diluents in ten types of used gasoline engine oils, taken from engines submitted to road, bench, and chassis dynamometer tests, were determined using headspace gas chromatograms after their peak intensities had been corrected according to their retention indices. These results were compared with those from ASTM D3525 to assess the appropriateness of the headspace GC method. A further attempt was made to analyze corrected headspace gas chromatograms by PONA analysis in order to determine the diluting components in the used engine oils. The results of the study revealed that there was no reason to think that the sample would decompose when injected into GC apparatus, and that the information on the gasoline diluent and its diluting components should be readily obtainable. Analysis showed that the diluting components of uncombusted gasoline consisted mainly of less combustible gasoline components.

Deposition of thin SiO{sub 2} films on polymers as a hard-coating using a microwave-ECR plasma

SiO{sub 2} thin films were deposited on automobile plastics at low temperatures using a microwave activated ECR plasma. Oxygen was used as the plasma gas while tetraethoxysilane (TEOS) was used as the source gas which was introduced into the downstream. In the present investigation high quality SiO{sub 2} films were deposited on polycarbonate (PC) and polypropylene (PP) substrates with and without a mesh and the characteristics of hard coating films were studied. The film growth rate increases with the decrease of substrate temperature when a mesh is inserted into the plasma. The irregularities of polymer surfaces could be planarized by the deposition of 1.0 {micro}m thick SiO{sub 2} film. The dynamic hardness of PC and PP are increased by the deposition of SiO{sub 2} film, however, films deposited on PP is seen to be cracked while that of on PC is crack-free.

Deposition of High Quality SiO 2 Films Using Teos by ECR Plasma

SiO2 thin firms were fabricated in a remote electron cyclotron resonance (ECR) plasma by tctraethoxysilane (TEOS) as the silicon source. Oxygen was used as the plasma gas. A mesh was placed between the TEOS gas outlet and the substrate. In the present investigation a-SiO2 films were deposited with and without the mesh and film properties were studied comparatively. The deposition rate increased when the mesh was attached. The optimum deposition rate is observed when the mesh voltage was zero, that is the mesh was grounded. The deposition rates of both methods were also dependnt on the TEOS flow rate, applied microwave power and the substrate temperature. These three parameters have significant roles in controlling the film quality. Good quality SiO2 films can be obtained with a higher deposition rate when a mesh is attached.