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Featured researches published by Mehrdad Mofidi.


international solid state circuits conference | 2007

A 56-nm CMOS 99-

Ken Takeuchi; Yasushi Kameda; Susumu Fujimura; Hiroyuki Otake; Koji Hosono; Hitoshi Shiga; Yoshihisa Watanabe; Takuya Futatsuyama; Yoshihiko Shindo; Masatsugu Kojima; Makoto Iwai; Masanobu Shirakawa; Masayuki Ichige; Kazuo Hatakeyama; Shinichi Tanaka; Teruhiko Kamei; Jia-Yi Fu; Adi Cernea; Yan Li; Masaaki Higashitani; Gertjan Hemink; Shinji Sato; Ken Oowada; Shih-Chung Lee; Naoki Hayashida; Jun Wan; Jeffrey W. Lutze; Shouchang Tsao; Mehrdad Mofidi; Kiyofumi Sakurai

A single 3.3-V only, 8-Gb NAND flash memory with the smallest chip to date, 98.8 mm2, has been successfully developed. This is the worlds first integrated semiconductor chip fabricated with 56-nm CMOS technologies. The effective cell size including the select transistors is 0.0075 mum2 per bit, which is the smallest ever reported. To decrease the chip size, a very efficient floor plan with one-sided row decoder, one-sided page buffer, and one-sided pad is introduced. As a result, an excellent 70% cell area efficiency is realized. The program throughput is drastically improved to twice as large as previously reported and comparable to binary memories. The best ever 10-MB/s programming is realized by increasing the page size from 4kB to 8kB. In addition, noise cancellation circuits and the dual VDD-line scheme realize both a small die size and a fast programming. An external page copy achieves a fast 93-ms block copy, efficiently using a 1-MB block size


international solid-state circuits conference | 2013

{\hbox {mm}}^{2}

Tz-yi Liu; Tian Hong Yan; Roy E. Scheuerlein; Yingchang Chen; Jeffrey Koon Yee Lee; Gopinath Balakrishnan; Gordon Yee; Henry Zhang; Alex Yap; Jingwen Ouyang; Takahiko Sasaki; Sravanti Addepalli; Ali Al-Shamma; Chin-Yu Chen; Mayank Gupta; Greg Hilton; Saurabh Joshi; Achal Kathuria; Vincent Lai; Deep Masiwal; Masahide Matsumoto; Anurag Nigam; Anil Pai; Jayesh Pakhale; Chang Hua Siau; Xiaoxia Wu; Ronald Yin; Liping Peng; Jang Yong Kang; Sharon Huynh

ReRAM has been considered as one of the potential technologies for the next-generation nonvolatile memory, given its fast access speed, high reliability, and multi-level capability. Multiple-layered architectures have been used for several megabit test-chips and memory macros [1-3]. This paper presents a MeOx-based 32Gb ReRAM test chip developed in 24nm technology.


IEEE Journal of Solid-state Circuits | 2009

8-Gb Multi-Level NAND Flash Memory With 10-MB/s Program Throughput

Raul-Adrian Cernea; Long Pham; Farookh Moogat; Siu Chan; Binh Le; Yan Li; Shouchang Tsao; Tai-Yuan Tseng; Khanh Nguyen; Jason Li; Jayson Hu; Jong Hak Yuh; Cynthia Hsu; Fanglin Zhang; Teruhiko Kamei; Hiroaki Nasu; Phil Kliza; Khin Htoo; Jeffrey W. Lutze; Yingda Dong; Masaaki Higashitani; Junnhui Yang; Hung-Szu Lin; Vamshi Sakhamuri; Alan Li; Feng Pan; Sridhar Yadala; Subodh Taigor; Kishan Pradhan; James Lan

A 16 Gb 4-state MLC NAND flash memory augments the sustained program throughput to 34 MB/s by fully exercising all the available cells along a selected word line and by using additional performance enhancement modes. The same chip operating as an 8 Gb SLC device guarantees over 60 MB/s programming throughput. The newly introduced all bit line (ABL) architecture has multiple advantages when higher performance is targeted and it was made possible by adopting the ldquocurrent sensingrdquo (as opposed to the mainstream ldquovoltage sensingrdquo) technique. The general chip architecture is presented in contrast to a state of the art conventional circuit and a double size data buffer is found to be necessary for the maximum parallelism attained. Further conceptual changes designed to counterbalance the area increase are presented, hierarchical column architecture being of foremost importance. Optimization of other circuits, such as the charge pump, is another example. Fast data access rate is essential, and ways of boosting it are described, including a new redundancy scheme. ABL contribution to energy saving is also acknowledged.


international solid-state circuits conference | 2006

A 130.7mm 2 2-layer 32Gb ReRAM memory device in 24nm technology

Ken Takeuchi; Yasushi Kameda; Susumu Fujimura; Hiroyuki Otake; Koji Hosono; Hitoshi Shiga; Y. Watanabe; Takuya Futatsuyama; Yoshihiko Shindo; Masatsugu Kojima; Makoto Iwai; Masanobu Shirakawa; Masayuki Ichige; Kazuo Hatakeyama; Sumio Tanaka; Teruhiko Kamei; Jia-Yi Fu; Adi Cernea; Yan Li; Masaaki Higashitani; Gertjan Hemink; Shinji Sato; Ken Oowada; Shih-Chung Lee; N. Hayashida; Jun Wan; Jeffrey W. Lutze; Shouchang Tsao; Mehrdad Mofidi; Kiyofumi Sakurai

Fabricated in 56nm CMOS technology, an 8Gb multi-level NAND Flash memory occupies 98.8mm2, with a memory cell size of 0.0075mum/b. The 10MB/s programming and 93ms block copy are also realized by introducing 8kB page, noise-cancellation circuits, external page copy and the dual VDD scheme enabling efficient use of 1MB blocks


international solid-state circuits conference | 2012

A 34 MB/s MLC Write Throughput 16 Gb NAND With All Bit Line Architecture on 56 nm Technology

Yan Li; Seungpil Lee; Ken Oowada; Hao Nguyen; Qui Nguyen; Nima Mokhlesi; Cynthia Hsu; Jason Li; Venky Ramachandra; Teruhiko Kamei; Masaaki Higashitani; Tuan Pham; Mitsuaki Honma; Yoshihisa Watanabe; Kazumi Ino; Binh Le; Byungki Woo; Khin Htoo; Tai-Yuan Tseng; Long Pham; Frank Tsai; Kwang-ho Kim; Yi-Chieh Chen; Min She; Jong Yuh; Alex Chu; Chen Chen; Ruchi Puri; Hung-Szu Lin; Yi-Fang Chen

This paper addresses challenges with improvements made over previous NAND generations to achieve high performance while maintaining a low fail-bit count (FBC) and cost savings from an improved architecture and tightly packed peripheral circuits. Air gap [2,3] technology further improves write throughput by reducing neighbor interference and WL RC. A toggle mode 400Mb/s I/O interface reduces system overhead and enhances overall performance.


international solid-state circuits conference | 2008

A 56nm CMOS 99mm2 8Gb Multi-level NAND Flash Memory with 10MB/s Program Throughput

Raul-Adrian Cernea; Long Pham; Farookh Moogat; Siu Chan; Binh Le; Yan Li; Shouchang Tsao; Tai-Yuan Tseng; Khanh Nguyen; Jason Li; J. Hu; Jong Park; Cynthia Hsu; Fanglin Zhang; Teruhiko Kamei; Hiroaki Nasu; Phil Kliza; Khin Htoo; Jeffrey W. Lutze; Yingda Dong; Masaaki Higashitani; Junhui Yang; Hung-Szu Lin; Vamshi Sakhamuri; A. Li; Feng Pan; Sridhar Yadala; Subodh Taigor; Kishan Pradhan; James Lan

In the diverse world of NAND flash applications, higher storage capacity is not the only imperative. Increasingly, performance is a differentiating factor and is also a way of creating new markets or expanding existing markets. While conventional memory uses, for actual operations, every other cell along a selected word line (WL) (Takeuchi, 2006), this design simultaneously exercises them all. A performance improvement of at least 100% is derived from this all-bitline (ABL) architecture relative to conventional chips. Additional techniques push performance to even higher levels.


Archive | 1996

128Gb 3b/cell NAND flash memory in 19nm technology with 18MB/s write rate and 400Mb/s toggle mode

Douglas J. Lee; Mehrdad Mofidi; Sanjay Mehrotra; Raul-Adrian Cernea


Archive | 1995

A 34MB/s-Program-Throughput 16Gb MLC NAND with All-Bitline Architecture in 56nm

Raul-Adrian Cernea; Douglas J. Lee; Mehrdad Mofidi; Sanjay Mehrotra


Archive | 1996

Concurrent write of multiple chunks of data into multiple subarrays of flash EEPROM

Douglas J. Lee; Sanjay Mehrotra; Mehrdad Mofidi; Daniel C. Guterman


Archive | 2005

Programmable power generation circuit for flash eeprom memory systems

Shahzad Khalid; Yan Li; Raul-Adrian Cernea; Mehrdad Mofidi

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Dive into the Mehrdad Mofidi's collaboration.

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