Michael B. Purvis

Performance optimization of MOPA pre-pulse LPP light source

This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the most recent results from high power sources in the field and testing on our laboratory based development systems, and describe the requirements and technical challenges related to successful implementation of those technologies on production sources. System performance is shown, focusing on pre-pulse operation with high conversion efficiency (CE) and with dose control to ensure high die yield. Finally, experimental results evaluating technologies for generating stable EUV power output for a high volume manufacturing (HVM) LPP source will be reviewed.

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

Abstract Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requirements in the following critical areas: power, dose stability, etendue, spectral content, and lifetime. Currently, development of second-generation laser-produced plasma (LPP) light sources for the ASML’s NXE:3300B EUV scanner is complete, and first units are installed and operational at chipmaker customers. We describe different aspects and performance characteristics of the sources, dose stability results, power scaling, and availability data for EUV sources and also report new development results.

Laser produced plasma light source development for HVM

This paper describes the development of a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193nm immersion double patterning technology for sub- 20nm critical layer patterning. In this paper we discuss the most recent results from high power testing on our development systems targeted at the 250W configuration, and describe the requirements and technical challenges related to successful implementation of these technologies. Subsystem performance will be shown including Conversion Efficiency (CE), dose control, collector protection and out-of-band (OOB) radiation measurements. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for a 250W HVM LPP source.

Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

In this paper, we provide an overview of various challenges and their solutions for scaling laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing. We will discuss improvements to source architecture that facilitated the increase of EUV power from 100W to >200W, and the technical challenges for power scaling of key source parameters and subsystems. Finally, we will describe current power-scaling research activities and provide a forward looking perspective for LPP EUV sources towards 500W.

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

In this paper, we provide an overview of various technologies for scaling tin laser-produced-plasma (LPP) extremeultraviolet (EUV) source performance to enable high volume manufacturing (HVM). We will show improvements to source architecture that facilitated the increase of EUV power from 100W to 250W, and the technical challenges for power scaling of key source parameters and subsystems. The performance of critical subsystems such as the Droplet Generator and Collector protection will be shown, with emphasis on stability and lifetime. Finally, we will describe current research activities and provide a perspective for LPP EUV sources towards 500W.

Kinetics of photopolymerization of acrylates studied with a cure monitor and photoDSC

Photopolymerization of a number of neat acrylate monomers used in polymer coatings of optical fiber was studied with photoDSC and with a cure monitor using a fluorescent probe. Acrylates had functionality from one to six. PhotoDSC results show that conversion of monomers ranges from 40 to 100% depending upon functionality and structure of a monomer. Kinetics of hardening of a sample under light at ambient temperature was nicely fit into two-exponential law; rate constants k1 and k2 in this empirical analysis are in the range 0.5 - 35 min-1. Dependence of rate of polymerization and conversion upon functionality of a monomer is discussed. Both cure monitor and photoDSC can be successfully used for testing of liquid coatings. It was demonstrated, that an application of a moderate permanent magnetic field increases rate of cure of coating up till 20%.