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Michael Layh

Carl Zeiss AG

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Publication

Featured researches published by Michael Layh.

Archive | 2014

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Stefan Xalter; Yim-Bun Patrick Kwan; András G. Major; Manfred Maul; Johannes Eisenmenger; Damian Fiolka; Jan Horn; Markus Deguenther; Florian Bach; Michael Patra; Johannes Wangler; Michael Layh

Archive | 2007

Illumination lens system for projection microlithography, and measuring and monitoring method for such an illumination lens system

Michael Patra; Markus Degünther; Michael Layh; Johannes Wangler; Manfred Maul

Archive | 2007

Illumination system for microlithographic projection exposure apparatus comprising an illumination system of this type

Markus Degünther; Michael Layh; Michael Gerhard; Bruno Thome; Wolfgang Singer

Archive | 2010

Illumination system for illuminating a mask in a microlithographic projection exposure apparatus

Markus Deguenther; Michael Layh

Archive | 2008

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

Oliver Wolf; Heiko Siekmann; Eva Kalchbrenner; Siegfried Rennon; Johannes Wangler; Andre Bresan; Michael Gerhard; Nils Haverkamp; Axel Scholz; Ralf Scharnweber; Michael Layh; Stefan Burkart

Archive | 2009

Optical distribution component for extreme UV-microlithography for manufacturing e.g. nano structured electronic-components, has base body exhibiting transmission for wavelengths smaller and greater than preset target wavelength range

Sebastian Dörn; Martin Endres; Christian Laubis; Michael Layh; Michael Ricker; Ralf Stützle; Holger Weigand

Archive | 2009

ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS

Michael Patra; Markus Deguenther; Michael Layh; Johannes Wangler; Manfred Maul

Archive | 2011

ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY AND PROJECTION EXPOSURE SYSTEM WITH AN ILLUMINATION OPTICAL SYSTEM OF THIS TYPE

Michael Patra; Markus Degünther; Michael Layh

Archive | 2010

Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus

Ralf Stuetzle; Martin Endres; Jens Ossmann; Michael Layh

Archive | 2008

Microlithographic illumination system

Markus Deguenther; Michael Layh; Michael Gerhard; Bruno Thome; Wolfgang Singer

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Collaboration

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Markus Degünther

Carl Zeiss AG

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Michael Patra

Carl Zeiss AG

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Markus Deguenther

Carl Zeiss AG

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Johannes Wangler

Carl Zeiss AG

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Markus Schwab

Carl Zeiss AG

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Damian Fiolka

Carl Zeiss AG

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Manfred Maul

Carl Zeiss AG

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Martin Endres

Carl Zeiss AG

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Michael Gerhard

Carl Zeiss AG

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Ralf Stützle

Carl Zeiss AG

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