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Ralf Stützle

Carl Zeiss AG

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Publication

Featured researches published by Ralf Stützle.

Archive | 2009

Beleuchtungsoptik für die EUV-Mikrolithographie

Martin Endres; Ralf Stützle; Jens Ossmann

Archive | 2009

Illumination optics for euv microlithography and illumination system and projection exposure apparatus comprising an illumination optics of this type

Damian Fiolka; Berndt Warm; Christian Steigerwald; Martin Endres; Ralf Stützle; Jens Ossmann; Ralf Scharnweber; Markus Hauf; Udo Dinger; Severin Waldis; Marc Kirch; Joachim Hartjes

Archive | 2006

Projection exposure equipment for microlithography, has illuminating optical unit for illuminating object field in object plane and correction screen is arranged in or adjacent to aperture diaphragm plane of projection optical unit

Martin Endres; Jens Ossmann; Ralf Stützle

Archive | 2007

Illumination lens for use in scanner-type projection illumination system e.g. stepper, for extreme ultraviolet microlithography, has correction element arranged in optical path of ultraviolet radiation between radiation source and location

Martin Endres; Jens Ossmann; Wolfgang Singer; Ralf Stützle

Archive | 2009

Optical distribution component for extreme UV-microlithography for manufacturing e.g. nano structured electronic-components, has base body exhibiting transmission for wavelengths smaller and greater than preset target wavelength range

Sebastian Dörn; Martin Endres; Christian Laubis; Michael Layh; Michael Ricker; Ralf Stützle; Holger Weigand

Archive | 2009

Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik

Damian Fiolka; Berndt Warm; Christian Steigerwald; Martin Endres; Ralf Stützle; Jens Ossmann; Ralf Scharnweber

Archive | 2009

Illumination lens for illumination of object field of projection lens of illumination system for extreme UV-projection microlithography during manufacturing e.g. nano structured component, has aperture shading distribution of facets

Michael Layh; Ralf Stützle

Archive | 2014

Verfahren zum Einstellen eines Beleuchtungssettings

Jörg Zimmermann; Ralf Stützle; Paul Gräupner; Olaf Conradi

Archive | 2008

Adjustment device for micro lithographic-projection illumination system, has auto collimation unit permitting adjustment accuracy, which is greater than specified value, where collimation unit is provided with light source and reflector

Ralf Stützle

Archive | 2009

Komponente zur Einstellung einer scanintegrierten Beleuchtungsenergie in einer Objektebene einer Mikrolithographie-Projektionsbelichtungsanlage

Ralf Stützle; Martin Endres; Jens Ossmann; Michael Layh

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Collaboration

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Martin Endres

Carl Zeiss AG

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Jens Ossmann

Carl Zeiss AG

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Michael Layh

Carl Zeiss AG

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Damian Fiolka

Carl Zeiss AG

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Berndt Warm

Carl Zeiss AG

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Christian Steigerwald

Carl Zeiss AG

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Ralf Scharnweber

Carl Zeiss AG

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Holger Weigand

Carl Zeiss AG

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Jörg Zimmermann

Carl Zeiss AG

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Olaf Conradi

Carl Zeiss AG

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