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Dive into the research topics where Michael Thomas Dugger is active.

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Featured researches published by Michael Thomas Dugger.


Other Information: PBD: 1 Jan 2000 | 2000

MEMS Reliability: Infrastructure, Test Structures, Experiments, and Failure Modes

Danelle M. Tanner; Norman F. Smith; Lloyd W. Irwin; William P. Eaton; Karen Sue Helgesen; J. Joseph Clement; William M. Miller; Samuel Lee Miller; Michael Thomas Dugger; Jeremy A. Walraven; Kenneth A. Peterson

The burgeoning new technology of Micro-Electro-Mechanical Systems (MEMS) shows great promise in the weapons arena. We can now conceive of micro-gyros, micro-surety systems, and micro-navigators that are extremely small and inexpensive. Do we want to use this new technology in critical applications such as nuclear weapons? This question drove us to understand the reliability and failure mechanisms of silicon surface-micromachined MEMS. Development of a testing infrastructure was a crucial step to perform reliability experiments on MEMS devices and will be reported here. In addition, reliability test structures have been designed and characterized. Many experiments were performed to investigate failure modes and specifically those in different environments (humidity, temperature, shock, vibration, and storage). A predictive reliability model for wear of rubbing surfaces in microengines was developed. The root causes of failure for operating and non-operating MEMS are discussed. The major failure mechanism for operating MEMS was wear of the polysilicon rubbing surfaces. Reliability design rules for future MEMS devices are established.


Journal of Tribology-transactions of The Asme | 1990

Liquid-Mediated Adhesion at the Thin Film Magnetic Disk/Slider Interface

Bharat Bhushan; Michael Thomas Dugger

The adhesive force between magnetic-recording heads and thin film disks in a direction normal to the interface has been measured for a variety of loads, contact times, separation rates, and relative humidities with and without a layer of perfluoropolyether lubricant at the interface. At low humidities, the adhesive force due to the lubricant film alone is small for the lubricant thickness and disk surface roughness used. We find that the major component of the adhesive force between the slider and the disk in humid environments may be attributed to an adsorbed water film which can displace the lubricant (if the disk is lubricated) at sufficiently high loads, during tangential sliding, or after extended exposure to high concentrations of water vapor and create menisci around individual asperity contacts. The adhesive force was found to increase with contact duration on the unlubricated disk, but was essentially independent of contact duration on the lubricated disk. For both lubricated and unlubricated disks, the adhesive force increased with increasing relative humidity and loading rate, but was independent of applied normal load.


Wear | 1990

Real contact area measurements on magnetic rigid disks

Bharat Bhushan; Michael Thomas Dugger

Abstract The real area of contact between a thin film rigid disk and an optically smooth surface has been measured using multiple-beam interferometry. The statistical distribution of contact sizes, the number of contacts and the total contact area have been determined using automated image analysis as a function of normal force. Contact sizes were found to be in the range of 1–2 μm in diameter and exhibited a weak dependence on the normal force, while the number of contacts increased with an increase in the normal pressure. These relationships agree well with predictions from microcontact analysis. We also find that contact size and number of contacts increase with loading time.


Tribology Transactions | 1993

Wear Mechanisms of Amorphous Carbon and Zirconia Coatings on Rigid Disk Magnetic Recording Media

Michael Thomas Dugger; Yip Wah Chung; Bharat Bhushan; W. Rothschild

Examination of the durability of zirconia-coated rigid disks in various environments reveals a sensitivity to the presence of water vapor during sliding, similar to that of carbon-coated rigid disks. Among the test environments investigated, i.e. vacuum, dry/moist air, and moist nitrogen, humidity had the greatest effect by increasing the contact life of the disks substantially over that of vacuum or dry air. The dominant factors affecting wear are believed to be oxidation of metallic debris and interaction of the overcoat layer with water vapor. Tests with ferrite read/write sliders on carbon-coated disks suggest that the pin-on-disk test is a valid simulation of the tribological behavior of this system. Carbon film thickness measurements indicate that the carbon film remains intact without appreciable thinning until the point of failure.


MRS Proceedings | 2000

Chemical vapor deposition coating for micromachines

Seethambal S. Mani; James G. Fleming; Jeffry J. Sniegowski; Maarten P. de Boer; Lawrence W. Irwin; Jeremy A. Walraven; Danelle M. Tanner; Michael Thomas Dugger

Two major problems associated with Si-based MEMS devices are stiction and wear. Surface modifications are needed to reduce both adhesion and friction in micromechanical structures to solve these problems. In this paper, the authors will present a process used to selectively coat MEMS devices with tungsten using a CVD (Chemical Vapor Deposition) process. The selective W deposition process results in a very conformal coating and can potentially solve both stiction and wear problems confronting MEMS processing. The selective deposition of tungsten is accomplished through silicon reduction of WF{sub 6}, which results in a self-limiting reaction. The selective deposition of W only on polysilicon surfaces prevents electrical shorts. Further, the self-limiting nature of this selective W deposition process ensures the consistency necessary for process control. Selective tungsten is deposited after the removal of the sacrificial oxides to minimize process integration problems. This tungsten coating adheres well and is hard and conducting, requirements for device performance. Furthermore, since the deposited tungsten infiltrates under adhered silicon parts and the volume of W deposited is less than the amount of Si consumed, it appears to be possible to release stuck parts that are contacted over small areas such as dimples. Results from tungsten deposition on MEMS structures with dimples will be presented. The effect of wet and vapor phase cleanings prior to the deposition will be discussed along with other process details. The W coating improved wear by orders of magnitude compared to uncoated parts. Tungsten CVD is used in the integrated-circuit industry, which makes this approach manufacturable.


Other Information: PBD: 1 Oct 2000 | 2000

Characterization of Sidewall and Planar Surfaces of Electroformed LIGA Parts

Somuri V. Prasad; Aaron Christopher. Hall; Michael Thomas Dugger

The nature of surfaces and the way they interact with each other during sliding contact can have a direct bearing on the performance of a microelectromechanical (MEMS) device. Therefore, a study was undertaken to characterize the surfaces of LIGA fabricated Ni and Cu components. Sidewall and planar surfaces were examined by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Surface roughness was quantified using the AFM. Post-processing (e.g. lapping, removal of polymer film) can profoundly influence the morphology of LIGA components. Edge rounding and smearing of ductile materials during lapping can result in undesirable sidewall morphologies. By judicious selection of AFM scan sizes, the native roughness ({approximately}10 nm RMS) can be distinguished from that arising due to post processing, e.g. scratches, debris, polymer films. While certain processing effects on morphology such as those due to lapping or release etch can be controlled, the true side wall morphology appears to be governed by the morphology of the polymer mold or by the electroforming process itself, and may be much less amenable to modification.


Archive | 2004

Mechanics and tribology of MEMS materials.

Somuri V. Prasad; Michael Thomas Dugger; Brad Lee Boyce; Thomas Edward Buchheit

Micromachines have the potential to significantly impact future weapon component designs as well as other defense, industrial, and consumer product applications. For both electroplated (LIGA) and surface micromachined (SMM) structural elements, the influence of processing on structure, and the resultant effects on material properties are not well understood. The behavior of dynamic interfaces in present as-fabricated microsystem materials is inadequate for most applications and the fundamental relationships between processing conditions and tribological behavior in these systems are not clearly defined. We intend to develop a basic understanding of deformation, fracture, and surface interactions responsible for friction and wear of microelectromechanical system (MEMS) materials. This will enable needed design flexibility for these devices, as well as strengthen our understanding of material behavior at the nanoscale. The goal of this project is to develop new capabilities for sub-microscale mechanical and tribological measurements, and to exercise these capabilities to investigate material behavior at this size scale.


Archive | 2008

Tribological Studies of Microelectromechanical Systems

Shannon J. Timpe; K. Komvopoulos; Bonnie R. Antoun; Michael Thomas Dugger

Understanding and controlling friction in micromachine interfaces is critical to the reliability and operational efficiency of microelectromechanical systems (MEMS). The relatively high adhesion forces and friction forces encountered in these devices often present major obstacles to the design of reliable MEMS devices. Using surface micromachining, arrays of microstructures are being designed and tested to examine the adhesion characteristics, static friction behavior, and dynamic friction response. Emphasis is also being given to the control and actuation of the test structures and the modeling of the dynamic response and contact mechanics at the interface. Specifically, the purpose of the research is to fabricate and test MEMS devices in order to obtain insight into the effect of surface topography, material properties, surface chemical state, environmental conditions, and contact load on the static and dynamic characteristics of the contact interface.


Other Information: PBD: 1 May 2000 | 2000

Materials Issues for Micromachines Development - ASCI Program Plan

Huei Eliot Fang; Corbett Chandler. Battaile; Gilbert L. Benavides; Mark T. Ensz; Thomas Edward Buchheit; David A. LaVan; Er-Ping Chen; Todd R. Christenson; Maarten P. de Boer; Samuel Lee Miller; Michael Thomas Dugger; Somuri V. Prasad; Earl David Reedy Jr.; Aidan P. Thompson; Chungnin C. Wong; Pin Yang

This report summarizes materials issues associated with advanced micromachines development at Sandia. The intent of this report is to provide a perspective on the scope of the issues and suggest future technical directions, with a focus on computational materials science. Materials issues in surface micromachining (SMM), Lithographic-Galvanoformung-Abformung (LIGA: lithography, electrodeposition, and molding), and meso-machining technologies were identified. Each individual issue was assessed in four categories: degree of basic understanding; amount of existing experimental data capability of existing models; and, based on the perspective of component developers, the importance of the issue to be resolved. Three broad requirements for micromachines emerged from this process. They are: (1) tribological behavior, including stiction, friction, wear, and the use of surface treatments to control these, (2) mechanical behavior at microscale, including elasticity, plasticity, and the effect of microstructural features on mechanical strength, and (3) degradation of tribological and mechanical properties in normal (including aging), abnormal and hostile environments. Resolving all the identified critical issues requires a significant cooperative and complementary effort between computational and experimental programs. The breadth of this work is greater than any single program is likely to support. This report should serve as a guide to plan micromachines development at Sandia.


Journal of Tribology-transactions of The Asme | 1990

Friction, wear, and interfacial chemistry in thin film magnetic rigid disk files

Michael Thomas Dugger; Yip Wah Chung; Bharat Bhushan; W. Rothschild

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Somuri V. Prasad

Sandia National Laboratories

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Brendan L Nation

Sandia National Laboratories

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Brad Lee Boyce

Sandia National Laboratories

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Danelle M. Tanner

Sandia National Laboratories

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Ronald S. Goeke

Sandia National Laboratories

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Michael Chandross

Sandia National Laboratories

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