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Dive into the research topics where Michio Komatsu is active.

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Featured researches published by Michio Komatsu.


Japanese Journal of Applied Physics | 2000

Dehydration after Plasma Oxidation of Porous Low-Dielectric-Constant Spin-on-Glass Films

Eiichi Kondoh; Tanemasa Asano; Hiroki Arao; Akira Nakashima; Michio Komatsu

In this paper, the dehydration behavior of hydrogen-methyl-siloxane-based porous spin-on-glass (SOG) films after oxygen plasma exposure is reported. The resultant loss of hydrophobic groups from the plasma exposure makes the films hygroscopic and thus the film dielectric constant can significantly increase. We employed a simple method consisting of spin-on coating of hexadimethyldisilazane (HMDS) with successive hotplate baking so as to dehydrate the films and decrease the film dielectric constant.


Journal of Applied Physics | 2005

Pore interconnectivity of nanoclustering silica porous films as studied by positronium time-of-flight spectroscopy

Kenji Ito; R.S. Yu; Kiminori Sato; Kouichi Hirata; Yoshinori Kobayashi; Toshikazu Kurihara; Miki Egami; Hiroki Arao; Akira Nakashima; Michio Komatsu

Positronium time-of-flight spectroscopy with improved stability and signal-to-noise ratio, achieved by a developed off-line digital data analysis, was applied to the characterization of three types of nanoclustering silica porous films with different relative dielectric constants and refractive indices. The emission of triplet ortho-positronium (o‐Ps) from the film surface was examined as a function of incident positron energy (Ein). It was found that the o‐Ps emission peak energies from two highly porous films with similar total porosities decrease similarly to each other with increasing Ein up to 1.50keV. On the other hand, o‐Ps emission intensities from the two films differed considerably in the range between 0.5keV<Ein<4keV, which reflects a difference in pore interconnectivity between the two films with different mean secondary particle sizes. Some interconnected pores are expected to be closed by the necking at the particle contacts as calcination proceeds, possibly leading to more necks in the pore...


MRS Proceedings | 1999

Film Properties of Low-Density and Ultra-Low-Dielectric-Constant Material

Ryo Muraguchi; Miki Egami; Hiroki Arao; Atsushi Tounai; Akira Nakashima; Michio Komatsu

We studied the effect of pore diameter on the film properties of low-density porous material with special interest in the pore diameter range below 5nm. A novel low-density material, Interpenetrated SOG (IPS), was designed to realize such porous character. It is composed of a pyrolic template, which is an organic olygomer, and framework, made from SOG polymer and silica sol, forming an interpenetrated structure. Thermal decomposition of the organic component successfully resulted in films with pore diameter range below 5nm. It is found that the dielectric constant and the pore diameter depended on the density and the film strength was affected by the average pore diameter. Practically, films with the average pore size below 5nm possessed dielectric constants as low as 2.2–2.0 and sufficient strength.


Archive | 2000

Silica-based microparticle, method for producing dispersion with the same, and base material with coating film

Yuji Hiyouhaku; Michio Komatsu; Mitsuru Nakai; Hiroyasu Nishida; 満 中井; 祐二 俵迫; 通郎 小松; 広泰 西田


Archive | 2003

Photoelectric cell and process for producing metal oxide semiconductor film for use in photoelectric cell

Tsuguo Koyanagi; Michio Komatsu; Hirokazu Tanaka; Katsuhiro Shirono


Archive | 2002

Tubular titanium oxide particles, method for preparing the same, and use of the same

Tsuguo Koyanagi; Katsuhiro Shirono; Atsushi Tanaka; Michio Komatsu


Archive | 1993

Multiple oxide sol, its production and base material

Michio Komatsu; Hiroyasu Nishida; Yuuji Tawarasako; Hiroo Yoshitome; 裕二 俵迫; 博雄 吉留; 通郎 小松; 広泰 西田


Archive | 1994

Conductive substrate and display device provided with transparent conductive substrate

Toshiharu Hirai; Michio Komatsu; Akira Nakashima; Yoneji Abe; Yukihiro Iwasaki


Archive | 1999

Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film

Akira Nakashima; Michio Komatsu


Archive | 1999

Coating liquid for forming a silica-containing film with a low-dielectric constant and substrate coated with such a film

Akira Nakashima; Atsushi Tonai; Michio Komatsu

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Hakaru Kyuragi

Nippon Telegraph and Telephone

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Katsuyuki Machida

Nippon Telegraph and Telephone

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Kazuo Imai

Nippon Telegraph and Telephone

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Kenji Ito

National Institute of Advanced Industrial Science and Technology

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Kouichi Hirata

National Institute of Advanced Industrial Science and Technology

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Yoshinori Kobayashi

National Institute of Advanced Industrial Science and Technology

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