Miguel A. Dominguez

Sudden cardiac death 1990: An update

In most cases, over 80% in our experience (Figure 1) [1–4], ambulatory sudden death (ASD) is due to the onset of malignant ventricular arrhythmia. In 50% of these, ventricular fibrillation (VF) preceded by classic ventricular tachycardia (VT) is responsible for ASD. In the remaining cases of malignant ventricular arrhythmia, VF is of abrupt onset or is preceded by “torsades de pointes”. In the 20% not due to malignant ventricular arrhythmia, the cause of ASD is bradyarrhythmia.

Semiconductor Materials by Ultrasonic Spray Pyrolysis and Their Application in Electronic Devices

Ultrasonic spray pyrolysis is a deposition technique that enables a fine mist of the precursor solution in order to deposit higher-density thin films. This characteristic makes of great potential the use of ultrasonically spray-deposited semiconductors films for lowcost, transparent, flexible and large-area applications. In this chapter, low-temperature deposition and characterization of ultrasonically spray-deposited zinc oxide (ZnO) films are presented. The ZnO films deposited by ultrasonic spray pyrolysis at 200°C were characterized by optical transmittance, photoluminescence spectroscopy, X-ray diffraction and Fourier transform infrared spectroscopy. The study of low-temperature annealing of ZnO films is also presented. Moreover, the characterization of aluminum-doped ZnO films deposited by ultrasonic spray pyrolysis at 200°C is presented. Finally, applications of these ultrasonic spray-deposited films in electronic devices are presented.

Amorphous, Polymorphous, and Microcrystalline Silicon Thin Films Deposited by Plasma at Low Temperatures

The present chapter is devoted to the study of amorphous (a-Si:H), polymorphous (pmSi:H), and microcrystalline (μc-Si:H) silicon, deposited by the plasma-enhanced chemical vapor deposition (PECVD) technique at low temperatures. We have studied the main deposition parameters that have strong influence on the optical, electrical, and structur‐ al properties of the polymorphous and microcrystalline materials. Our results reveal the key deposition conditions for obtained films with optical and electrical characteristics, which are suitable for applications on thin-film solar cells and semiconductor devices.