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Dive into the research topics where Minghong Yang is active.

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Featured researches published by Minghong Yang.


MOEMS display and imaging systems. Conference | 2005

Highly reflective coatings for micromechanical mirror arrays operating in the DUV and VUV spectral range

Thilo Sandner; Jan Uwe Schmidt; Harald Schenk; Hubert Lakner; Alexandre Gatto; Minghong Yang; Norbert Kaiser; Stefan Braun; Thomas Foltyn; Andreas Leson

High reflecting low-stress optical coatings for the next-generation of micro mechanical mirrors have been developed. The optimized metal systems are applicable from VUV and DUV down to the UV and VIS spectral region and can be integrated in the technology of MOEMS, such as spatial light modulators (SLM) and micro scanning mirrors. This optimized metal designs enable to reconcile high optical performances with adequate mechanical properties and convenient CMOS compatibility. Currently, micro-mirror arrays with enhanced highly reflective coatings for DUV (λ = 193 nm) and VUV (λ = 157 nm) exist as prototypes.


Applied Optics | 2006

Highly reflecting aluminum-protected optical coatings for the vacuum-ultraviolet spectral range

Minghong Yang; Alexandre Gatto; Norbert Kaiser

We discuss the approaches to preserve the high-reflectance aluminum mirror for the vacuum-ultraviolet spectral region. Single fluoride and oxide layers, a homogeneous multilayer, and hybrid multilayer solutions are put forward. Single fluoride and oxide materials have achieved reflectance above 90% at 193 nm. Multilayer capping can provide reflectance of 93.4% at 193 nm, and a hybrid multilayer of fluoride and oxide can achieve reflectance above 90% to 160 nm.


Applied Optics | 2006

High-performance coatings for micromechanical mirrors

Alexandre Gatto; Minghong Yang; Norbert Kaiser; Jörg Heber; Jan Uwe Schmidt; Thilo Sandner; Harald Schenk; Hubert Lakner

High-performance coatings for micromechanical mirrors were developed. The high-reflective metal systems can be integrated into the technology of MOEMS, such as spatial light modulators and microscanning mirrors from the near-infrared down to the vacuum-ultraviolet spectral regions. The reported metal designs permit high optical performances to be merged with suitable mechanical properties and fitting complementary metal-oxide semiconductor compatibility.


Proceedings of SPIE, the International Society for Optical Engineering | 2006

Highly reflective optical coatings for high-power applications of micro scanning mirrors in the UV-VIS-NIR spectral region

Thilo Sandner; Jan Uwe Schmidt; Harald Schenk; Hubert Lakner; Minghong Yang; Alexandre Gatto; Norbert Kaiser; Stefan Braun; Thomas Foltyn; Andreas Leson

This paper addresses different highly reflective optical coatings on micro scanning mirrors (MSM) for applications in the NIR-VIS-UV- spectral region to enable new applications at high optical power density like laser marking and material treatment. In the common case of MSM with an unprotected Al coating, the absorption limits the maximal power density because of induced heating. In contrast to macroscopic optics HR-micro mirror coatings have to guarantee additional demands like low-stress and CMOS compatibility. Hence, to enable novel high power applications of MSM in the NIR-VIS-UV spectral region highly reflective low-stress coatings have been developed according to a triple strategy: (a) broadband metallic reflectors, (b) dielectric multilayers and (c) enhanced hybrid coatings. For Au and Ag based NIR-coatings an excellent mirror planarity and a reflectance around 99 % (@ 1064 nm) have been achieved, whereas dielectric coatings reached 99.7 % for a (LH)4 design and thinner low-stress hybrid NIR-coatings reached up to 99.8 % enabling an improved mirror planarity and excellent laser damage threshold. For the VIS and UV spectral region enhanced hybrid HR-coatings have been favored, because they enable high reflectance of up to 99.7 % @ 633 nm or 98.8 % @ 308 nm in combination with low stress, high mirror planarity and CMOS compatibility.


MOEMS display and imaging systems. Conference | 2005

Micromechanical scanning mirrors with highly reflective NIR coatings for high power applications

Thilo Sandner; Jan Uwe Schmidt; Harald Schenk; Hubert Lakner; Stefan Braun; Thomas Foltyn; Andreas Leson; Alexandre Gatto; Minghong Yang; Norbert Kaiser

This paper addresses different highly reflective optical coatings on micro scanning mirrors (MSM) for applications in the NIR-spectral region to enable new applications like laser marking and material treatment at high optical power density. In the case of MSM with an unprotected Al coating, the absorption limits the maximal power density because of induced heating. The damage threshold for unprotected Al coatings was investigated. In addition highly reflective enhanced metallic and dielectric multilayer coatings for the NIR have been developed and characterized. These coatings resolve the problems of unprotected aluminum coatings related to NIR absorption and the resulting limitation of applicable laser power density. The coatings ensure a high reflectance even in corrosive environments. Enhanced metallic broadband reflectors reach a reflectivity of 98.7% at 1064 nm whereas narrow-band dielectric multilayer coatings reach a reflectivity of 99.7% at 1064 nm.


Applied Optics | 2006

Design and deposition of vacuum-ultraviolet narrow-bandpass filters for analytical chemistry applications

Minghong Yang; Alexandre Gatto; Norbert Kaiser

Vacuum-ultraviolet (VUV) narrow-bandpass filters with central wavelengths at 177.5, 180.7, and 193 nm are necessary for analytical chemistry applications and for atomic emission spectrum separation. The emission spectra are so close that the required passbands of these filters are 1 to 2 nm with a maximum of 2 nm. We first investigated the designs based on the Fabry-Perot model with fluoride materials and second the deposition of narrow-bandpass filter components by using evaporation deposition. VUV spectral characterizations show that the filter components meet the requirements for analytical chemistry applications.


Applied Optics | 2006

Toward resistant vacuum-ultraviolet coatings for free-electron lasers down to 150 nm

Alexandre Gatto; Minghong Yang; Norbert Kaiser; Stefan Günster; Detlev Ristau; M. Trovo; M.B. Danailov

Research and development are currently trying to run a storage ring free-electron laser down to 150 nm with robust optics. Vacuum-ultraviolet fluoride optics with protected oxide layers and enhanced metallic mirrors are investigated.


Proceedings of SPIE, the International Society for Optical Engineering | 2005

Highly reflective thin film coatings for high power applications of micro scanning mirrors in the NIR-VIS-UV spectral region

Thilo Sandner; Jan Uwe Schmidt; Harald Schenk; Hubert Lakner; Minghong Yang; Alexandre Gatto; Norbert Kaiser; Stefan Braun; Thomas Foltyn; Andreas Leson

This paper addresses different highly reflective optical coatings on micro scanning mirrors (MSM) for applications in the NIR-VIS-UV-spectral region to enable new applications at high optical power density like laser marking and material treatment. In the common case of MSM with an unprotected Al coating, the absorption limits the maximal power density because of induced heating. In contrast to macroscopic optics HR-micro mirror coatings have to guarantee additional demands like low-stress and CMOS compatibility. Hence, to enable novel high power applications of MSM in the NIR-VIS-UV spectral region highly reflective low-stress coatings have been developed according to a triple strategy: (a) broadband metallic reflectors, (b) dielectric multilayers and (c) enhanced hybrid coatings. For Au and Ag based NIR-coatings an excellent mirror planarity and a reflectance around 99 % (@ 1064 nm) have been achieved, whereas dielectric coatings reached 99.7 % for a (LH)4 design and thinner low-stress hybrid NIR-coatings reached up to 99.8% enabling an improved mirror planarity and excellent laser damage threshold. For the VIS and UV spectral region enhanced hybrid HR-coatings have been favored, because they enable high reflectance of up to 99.7 % @ 633 nm or 98.8 % @ 308 nm in combination with low stress, high mirror planarity and CMOS compatibility.


Proceedings of SPIE, the International Society for Optical Engineering | 2005

VUV spectrophotometry for photomasks characterization at 193 nm

Minghong Yang; Jork Leiterer; Alexandre Gatto; Norbert Kaiser; Ingo Höllein; Silvio Teuber; Karsten Bubke

This paper intends to develop a measurement system to characterize photomasks for 193 nm lithography applications. Based on the VUV spectrophotometer at the Fraunhofer IOF institute, some modifications have been addressed to fulfil these special measurements. Characterizations on photomasks have been successfully carried out, which show good correlations to simulations.


Proceedings of SPIE, the International Society for Optical Engineering | 2005

VUV optical coatings for the next-generation micro-mechanical mirrors

Minghong Yang; Alexandre Gatto; Norbert Kaiser; Jan Uwe Schmidt; Thilo Sandner; Jörg Heber; Harald Schenk; Hubert Lakner

This paper deals with vacuum UV optical coatings for micro mirrors applications. High reflecting low-stress optical coatings for the next-generation of micro mechanical mirrors have been developed. The optimized metal systems are applicable for the VUV spectral region and can be integrated in the technology of MOEMS, such as spatial light modulators (SLM) and micro scanning mirrors.

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Stefan Braun

Dresden University of Technology

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M. Trovo

Elettra Sincrotrone Trieste

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M.B. Danailov

Elettra Sincrotrone Trieste

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