Mohamed Belmoubarik

Intersubband transitions in ZnO multiple quantum wells

Intersubband transitions in ZnO∕MgZnO multiple quantum wells (MQWs) are investigated by a photocurrent spectroscopy. Photocurrent peaks are observed in the energy range from 300to400meV and shifted to higher energy by reducing the ZnO well thickness. Polarization-resolved photocurrent spectra show that these peaks are observed when the polarization of incident lights is TM mode, following the intersubband selection rule. Calculation indicates that the photocurrent peaks are the intersubband transition from the first to the third subband in ZnO∕MgZnO MQWs.

MgAl2O4(001) based magnetic tunnel junctions made by direct sputtering of a sintered spinel target

We developed a fabrication process of an epitaxial MgAl2O4 barrier for magnetic tunnel junctions (MTJs) using a direct sputtering method from an MgAl2O4 spinel sintered target. Annealing the sputter-deposited MgAl2O4 layer sandwiched between Fe electrodes led to the formation of a (001)-oriented cation-disorder spinel with atomically sharp interfaces and lattice-matching with the Fe electrodes. A large tunnel magnetoresistance ratio up to 245% at 297 K (436% at 3 K) was achieved in the Fe/MgAl2O4/Fe(001) MTJ as well as an excellent bias voltage dependence. These results indicate that the direct sputtering is an alternative method for the realization of high performance MTJs with a spinel-based tunnel barrier.

Investigation of ZnO thin films deposited on ferromagnetic metallic buffer layer by molecular beam epitaxy toward realization of ZnO-based magnetic tunneling junctions

Deposition of ZnO thin films on a ferromagnetic metallic buffer layer (Co3Pt) by molecular beam epitaxy technique was investigated for realization of ZnO-based magnetic tunneling junctions with good quality hexagonal ZnO films as tunnel barriers. For substrate temperature of 600 °C, ZnO films exhibited low oxygen defects and high electrical resistivity of 130 Ω cm. This value exceeded that of hexagonal ZnO films grown by sputtering technique, which are used as tunnel barriers in ZnO-MTJs. Also, the effect of oxygen flow during deposition on epitaxial growth conditions and Co3Pt surface oxidation was discussed.

MgGa2O4 spinel barrier for magnetic tunnel junctions: Coherent tunneling and low barrier height

Epitaxial Fe/magnesium gallium spinel oxide (MgGa2O4)/Fe(001) magnetic tunnel junctions (MTJs) were fabricated by magnetron sputtering. A tunnel magnetoresistance (TMR) ratio up to 121% at room temperature (196% at 4 K) was observed, suggesting a TMR enhancement by the coherent tunneling effect in the MgGa2O4 barrier. The MgGa2O4 layer had a spinel structure and it showed good lattice matching with the Fe layers owing to slight tetragonal lattice distortion of MgGa2O4. Barrier thickness dependence of the tunneling resistance and current-voltage characteristics revealed that the height of the MgGa2O4 barrier is much lower than that of an MgAl2O4 barrier. This study demonstrates the potential of Ga-based spinel oxides for MTJ barriers having a large TMR ratio at a low resistance area product.

Giant tunnel magnetoresistance in polycrystalline magnetic tunnel junctions with highly textured MgAl2O4(001) based barriers

Although single-crystalline spinel (MgAl2O4)-based magnetic tunnel junctions (MTJs) are known to show a good bias voltage dependence of a tunnel magnetoresistance (TMR) ratio over MgO-based MTJs, no polycrystalline MgAl2O4-based MTJs exhibiting large TMR ratios have been grown previously due to the lack of crystallinity of the MgAl2O4 barrier. In this work, we demonstrate the growth of polycrystalline-based MTJs with large TMR ratios exceeding 240% and an improved bias voltage dependence compared to that of MgO-based MTJs. An ultra-thin CoFe/MgO seed layer on the amorphous CoFeB layer induced the growth of a highly (001)-textured MgAl2O4 barrier, which worked as a template layer for the solid epitaxy of CoFe grains during the crystallization of the CoFeB layers. High resolution scanning transmission electron microscopy shows lattice-matched epitaxy between the (001)-textured MgAl2O4 barrier and CoFe grains. This study demonstrates the industrial viability of MgAl2O4-based polycrystalline MTJs with an impr...

Effect of Mg-Al insertion on magnetotransport properties in epitaxial Fe/sputter-deposited MgAl2O4/Fe(001) magnetic tunnel junctions

We investigated the effect of an Mg-Al layer insertion at the bottom interface of epitaxial Fe/MgAl2O4/Fe(001) magnetic tunnel junctions (MTJs) on their spin-dependent transport properties. The tunnel magnetoresistance (TMR) ratio and differential conductance spectra for the parallel magnetic configuration exhibited clear dependence on the inserted Mg-Al thickness. A slight Mg-Al insertion (thickness 0.2 nm) induced a reduction of TMR ratios and featureless conductance spectra, indicating a degradation of the bottom-Fe/MgAl2O4 interface. Therefore, a minimal Mg-Al insertion was found to be effective to maximize the TMR ratio for a sputtered MgAl2O4-based MTJ.

Epitaxial wurtzite-MgZnO barrier based magnetic tunnel junctions deposited on a metallic ferromagnetic electrode

An epitaxial wurtzite (WZ) Mg0.23Zn0.77O barrier based magnetic tunnel junction (MTJ), with electrode-barrier structure of Co0.30Pt0.70 (111)/Mg0.23Zn0.77O (0001)/Co (0001), was fabricated. The good crystallinity and tunneling properties were experimentally confirmed. Electrical and magnetic investigations demonstrated its high resistance-area product of 1.05 MΩ μm2, a maximum tunneling magneto-resistance (TMR) of 35.5%, and the existence of localized states within the tunneling barrier producing TMR rapid decrease and oscillation when increasing the applied bias voltage. The TMR value almost vanished at 200 K, which was attributed to the induced moment and strong spin-orbit coupling in Pt atoms at the Co0.30Pt0.70/Mg0.23Zn0.77O interface. Owing to the ferroelectric behavior in WZ-MgZnO materials, the fabrication of WZ-MgZnO barrier based MTJs deposited on a metallic ferromagnetic electrode will open routes for electrically controllable non-volatile devices that are compatible with CMOS technology.

Epitaxial magnetic tunnel junctions with a low barrier height spinel MgGa 2 O 4

MgO barrier based magnetic tunnel junctions (MTJs) have drawn great attention because of their important spintronic device applications such as read heads of hard disk drives and non-volatile magnetoresistive random access memories (MRAMs).

Tunneling electroresistance of MgZnO-based tunnel junctions

We investigated the tunneling electroresistance (TER) in metal/wurtzite-MgZnO/metal junctions for applications in nonvolatile random-access memories. A resistive switching was detected utilizing an electric-field cooling at ±1 V and exhibited a TER ratio of 360%–490% at 2 K. The extracted change in the average barrier height between the two resistance states gave an estimation of the MgZnO electric polarization at 2.5 μC/cm2 for the low-temperature limit. In addition, the temperature-dependent TER ratio and the shift of the localized states energies at the barrier interface supported the ferroelectric behavior of the MgZnO tunnel-barrier. From the first-principles calculations, we found a similar effect of the barrier height change coming from the reversal of ZnO electric polarization. The possibility of using metal electrodes and lower growth temperatures, in addition to the ferroelectric property, make the ZnO-based memory devices suitable for CMOS integration.