Momtchil Stavrev

Method for fabricating a contact hole plane in a memory module

Method for production of a semiconductor structure

Carbon hard masks for etching sub-90nm structures

Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding use of the etching mask

Silicon substrate isolation trenches etching method for use during manufacturing of DRAM cells, involves aligning etching gas components such that etching depth at two different sized upper surface sections of substrate has same size

Verfahren zum Herstellen einer Ätzmaske auf einer Mikrostruktur, insbesondere einer Halbleiterstruktur mit Grabenkondensatoren, und entsprechende Verwendung der Ätzmaske

Production of insulating regions in semiconductor memories comprises forming a hard mask with openings in a region of a stronger electrical insulation and in a region of a weaker electrical insulation on a substrate, and further processing

A method of etching depressions in a silicon substrate

Manufacturing method of semiconductor structure

Manufacturing method of a semiconductor structure