Nobuo Mikoshiba

Process for forming deposited film by use of alkyl aluminum hydride

Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation

Deposited film formation method utilizing selective deposition by use of alkyl aluminum hydride

Process for forming deposited film

Plasma CVD of aluminum films

Spread spectrum communication apparatus

Surface acoustic wave device using an elastic substrate and an aluminum nitride piezoelectric film

Multi-layer acoustic surface wave device having minimal delay time temperature coefficient

Process for forming metal deposited film containing aluminum as main component by use of alkyl hydride

Spread spectrum communication device