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Dive into the research topics where Oliver Blank is active.

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Featured researches published by Oliver Blank.


international reliability physics symposium | 2006

Analysis of NBTI Degradation- and Recovery-Behavior Based on Ultra Fast VT-Measurements

Hans Reisinger; Oliver Blank; Wolfgang Heinrigs; A. Muhlhoff; Wolfgang Gustin; Christian Schlünder

We present a new direct VT measurement technique with arbitrary choice of drain voltage and a mus delay (factor of 1000 improvement) after stress. As shown this technique enables a meaningful comparison of data to theory (e.g. DeltaVT measurable as response to stress times from 100mus over 10 decades in time and an analysis of recovery over 11 decades in time) which may lead to a better understanding of NBTI. A fast precursor due to bulk trapping was found to significantly influence degradation slopes for all times. Based on a physical model - standard reaction/diffusion model plus fast bulk trapping -with just 3 fit parameters experimental degradation can be well modelled and degradation slopes <frac14 as well as > frac14 (both reported in literature) can be explained. A lifetime extrapolation based on this physical model is superior to the common straight line fit. There is no satisfying agreement of recovery data with reaction/diffusion theory. Further experimental and theoretical work is going to be needed


IEEE Transactions on Device and Materials Reliability | 2007

A Comparison of Very Fast to Very Slow Components in Degradation and Recovery Due to NBTI and Bulk Hole Trapping to Existing Physical Models

Hans Reisinger; Oliver Blank; Wolfgang Heinrigs; Wolfgang Gustin; Christian Schlünder

A new measuring technique with a 1mus measuring delay and a direct VT determination has been employed. The response to stress times as short as 100 mus to 105 has been studied as well as recovery over 12 decades in time. These experimental data allow a meaningful comparison to theory. Degradation data cut be precisely fitted to a simple physical model with 3 parameters thus enabling a reliable lifetime prediction from stress times below 104s.


european conference on power electronics and applications | 2013

Robustness of MOSFET devices under hard commutation ofthe body diode

Ralf Siemieniec; Oliver Blank; Michael Hutzler; L. J. Yip; J. Sanchez

This paper presents a study of the behavior of power MOSFET devices under hard commutation of the body diode as well as improvements of that behavior shown by latest technology developments based on detailed simulations of the device. Hard commutation of the body diode can represent a challenging mode of operation in regards to the ruggedness of power MOSFET devices. Also, the behavior of the body diode under hard commutation and its corresponding effects on the application are analyzed.


Archive | 2008

Semiconductor device and method for forming same

Oliver Blank; Uli Hiller; Maximilian Roesch; Walter Rieger


Archive | 2008

Integrated circuit device with a semiconductor body and method for the production of an integrated circuit device

Uli Hiller; Oliver Blank; Ralf Siemieniec; Maximilian Roesch


Archive | 2012

Method of manufacturing a semiconductor device using a contact implant and a metallic recombination element and semiconductor

Oliver Blank; Michael Hutzler; David Laforet; Ralf Siemieniec


Archive | 2010

Trench Semiconductor Device and Method of Manufacturing

Oliver Blank; Ralf Siemieniec; Martin Poelzl; Maximilian Roesch


Archive | 2008

Semiconductor device and method for the production of a semiconductor device

Franz Hirler; Walter Rieger; Andrew Wood; Mathias Born; Ralf Siemieniec; Jan Ropohl; Martin Poelzl; Oliver Blank; Uli Hiller; Oliver Haeberlen; Rudolf Zelsacher; Maximilian Roesch; Joachim Krumrey


Archive | 2012

Method of manufacturing a semiconductor device using an impurity source containing a metallic recombination element and semiconductor device

Michael Hutzler; Ralf Siemieniec; Oliver Blank


Archive | 2011

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING

Oliver Blank

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