P.J. van Veldhoven

Lasing of wavelength-tunable (1.55μm region) InAs∕InGaAsP∕InP (100) quantum dots grown by metal organic vapor-phase epitaxy

The authors report lasing of InAs∕InGaAsP∕InP (100) quantum dots (QDs) wavelength tuned into the 1.55μm telecom region. Wavelength control of the InAs QDs in an InGaAsP∕InP waveguide is based on the suppression of As∕P exchange through ultrathin GaAs interlayers. The narrow ridge-waveguide QD lasers operate in continuous wave mode at room temperature on the QD ground state transition. The low threshold current density of 580A∕cm2 and low transparency current density of 6A∕cm2 per QD layer, measured in pulsed mode, are accompanied by low loss and high gain with an 80-nm-wide gain spectrum.

InP/InGaAs Photodetector on SOI Photonic Circuitry

We present an InP-based membrane p-i-n photodetector on a silicon-on-insulator sample containing a Si-wiring photonic circuit that is suitable for use in optical interconnections on Si integrated circuits (ICs). The detector mesa footprint is 50 μm2, which is the smallest reported to date for this kind of device, and the junction capacitance is below 10 fF, which allows for high integration density and low dynamic power consumption. The measured detector responsivity and 3-dB bandwidth are 0.45 A/W and 33 GHz, respectively. The device fabrication is compatible with wafer-scale processing steps, guaranteeing compatibility toward future-generation electronic IC processing.

Waveguide-coupled nanopillar metal-cavity light-emitting diodes on silicon

Nanoscale light sources using metal cavities have been proposed to enable high integration density, efficient operation at low energy per bit and ultra-fast modulation, which would make them attractive for future low-power optical interconnects. For this application, such devices are required to be efficient, waveguide-coupled and integrated on a silicon substrate. We demonstrate a metal-cavity light-emitting diode coupled to a waveguide on silicon. The cavity consists of a metal-coated III–V semiconductor nanopillar which funnels a large fraction of spontaneous emission into the fundamental mode of an InP waveguide bonded to a silicon wafer showing full compatibility with membrane-on-Si photonic integration platforms. The device was characterized through a grating coupler and shows on-chip external quantum efficiency in the 10−4–10−2 range at tens of microamp current injection levels, which greatly exceeds the performance of any waveguide-coupled nanoscale light source integrated on silicon in this current range. Furthermore, direct modulation experiments reveal sub-nanosecond electro-optical response with the potential for multi gigabit per second modulation speeds.

Polarization control of gain of stacked InAs∕InP (100) quantum dots at 1.55μm: Interplay between ground and excited state transitions

The linear polarization of the optical gain of closely stacked InAs∕InP (100) quantum dots (QDs) grown by metal-organic vapor-phase epitaxy with emission wavelength tuned into the 1.55μm region is controlled by the number of stacked QD layers and the injection current. Increasing the number of stacked QD layers to five rotates the linear polarization of the cleaved-side photoluminescence and QD ground state (GS) gain, determined from the amplified spontaneous emission (ASE) of a Fabry–Perot ridge-waveguide laser, from transverse electric (TE) to transverse magnetic due to vertical electronic coupling. When the QD GS ASE and gain saturate with an increase of the injection current and the excited state ASE and gain become dominant, the linear polarization of ASE and gain changes back to TE. This limits the polarization insensitive operation of QD-based semiconductor optical amplifiers, however, opening routes to novel functionalities.

Submicron active-passive integration with position and number controlled InAs∕InP (100) quantum dots (1.55μm wavelength region) by selective-area growth

The authors report lateral positioning and number control of InAs quantum dots (QDs) on truncated InP (100) pyramids by selective-area metal organic vapor-phase epitaxy. With reducing QD number, sharp emission peaks are observed from individual and single QDs with wavelength tuned into the 1.55μm telecom region by insertion of ultrathin GaAs interlayers beneath the QDs. Regrowth of a passive waveguide structure around the pyramids establishes submicrometer-scale active-passive integration for efficient microcavity QD nanolasers and single photon sources.

Ultralow Surface Recombination Velocity in Passivated InGaAs/InP Nanopillars

The III–V semiconductor InGaAs is a key material for photonics because it provides optical emission and absorption in the 1.55 μm telecommunication wavelength window. However, InGaAs suffers from pronounced nonradiative effects associated with its surface states, which affect the performance of nanophotonic devices for optical interconnects, namely nanolasers and nanodetectors. This work reports the strong suppression of surface recombination of undoped InGaAs/InP nanostructured semiconductor pillars using a combination of ammonium sulfide, (NH4)2S, chemical treatment and silicon oxide, SiOx, coating. An 80-fold enhancement in the photoluminescence (PL) intensity of submicrometer pillars at a wavelength of 1550 nm is observed as compared with the unpassivated nanopillars. The PL decay time of ∼0.3 μm wide square nanopillars is dramatically increased from ∼100 ps to ∼25 ns after sulfur treatment and SiOx coating. The extremely long lifetimes reported here, to our knowledge the highest reported to date for undoped InGaAs nanostructures, are associated with a record-low surface recombination velocity of ∼260 cm/s. We also conclusively show that the SiOx capping layer plays an active role in the passivation. These results are crucial for the future development of high-performance nanoscale optoelectronic devices for applications in energy-efficient data optical links, single-photon sensing, and photovoltaics.

Monolithically integrated widely tunable laser source operating at 2 μm

We present a widely tunable extended cavity ring laser operating at 2 μm that is monolithically integrated on an indium phosphide substrate. The photonic integrated circuit is designed and fabricated within a multiproject wafer run using a generic integration technology platform. The laser features an intracavity tuning mechanism based on nested asymmetric Mach–Zehnder interferometers with voltage controlled electro-refractive modulators. The laser operates in a single-mode regime and is tunable over the recorded wavelength range of 31 nm, spanning from 2011 to 2042 nm. Its capability for high-resolution scanning is demonstrated in a single-line spectroscopy experiment using a carbon dioxide reference cell.

Measurement and Analysis of Temperature-Dependent Optical Modal Gain in Single-Layer InAs/InP(100) Quantum-Dot Amplifiers in the 1.6- to 1.8-

In this paper, measurements and analysis of the small-signal net modal gain of single-layer InAs/InP(100) quantum-dot (QD) optical amplifiers are presented. The amplifiers use only a single layer of InAs QDs on top of a thin InAs quantum well. The devices have been fabricated using a layer stack that is compatible with active-passive integration scheme, which makes further integration possible. The measurement results show sufficient optical gain in the amplifiers and can thus be used in applications such as lasers for long-wavelength optical coherence tomography and gas detection. The temperature dependence of the modal gain is also characterized. An existing rate-equation model was adapted and has been applied to analyze the measured gain spectra. The current injection efficiency has been introduced in the model to obtain a good fit with the measurement. It is found that only a small portion ( ~ 1.7%) of the injected carriers is actually captured by the QDs. The temperature dependence of several parameters describing the QDs is also discovered. The mechanisms causing the blue shift of peak gain as the current density increases and the temperature changes are analyzed and discussed in detail.

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We developed an InP-based photodetector which was bonded on a CMOS wafer containing a Si3N4-wiring photonic circuit. The detector fabrication is compatible with wafer scale processing steps, guaranteeing compatibility towards future generation electronic IC processing. Integration technology and experimental results are presented in this paper.

Wavelength Range

We report lateral wavelength control of InAs quantum dots (QDs) embedded in InGaAsP on InP (100) substrates by selective-area metal organic vapor-phase epitaxy (SA MOVPE). The technologically important 1.55μm telecommunications wavelength region is assessed by the combination of ultrathin GaAs interlayers beneath the QDs with proper SiNx mask design. Atomic force microscopy and microphotoluminescence reveal evolution of the QDs formed by 2 ML InAs as a function of growth rate enhancement with pronounced height and density increase, resulting in a wide wavelength tuning range of 110nm. Saturation of QD formation is observed for 3 ML InAs supply producing a much smaller tuning range of only 25nm which is supported by the increasing GaAs interlayer thickness. Hence, two regimes are identified allowing either wide wavelength tuning or wavelength stability of QDs in the 1.55μm region offering complementary applications of the monolithic integration of optoelectronic devices by SA MOVPE.