Peter Cuony

Mixed-phase p-type silicon oxide containing silicon nanocrystals and its role in thin-film silicon solar cells

Lower absorption, lower refractive index, and tunable resistance are three advantages of amorphous silicon oxide containing nanocrystalline silicon grains (nc-SiOx) compared to microcrystalline silicon (μc-Si), when used as a p-type layer in μc-Si thin-film solar cells. We show that p-nc-SiOx with its particular nanostructure increases μc-Si cell efficiency by reducing reflection and parasitic absorption losses depending on the roughness of the front electrode. Furthermore, we demonstrate that the p-nc-SiOx reduces the detrimental effects of the roughness on the electrical characteristics, and significantly increases μc-Si and Micromorph cell efficiency on substrates until now considered too rough for thin-film silicon solar cells.

Resistive interlayer for improved performance of thin film silicon solar cells on highly textured substrate

The deposition of thin-film silicon solar cells on highly textured substrates results in improved light trapping in the cell. However, the growth of silicon layers on rough substrates can often lead to undesired current drains, degrading performance and reliability of the cells. We show that the use of a silicon oxide interlayer between the active area and the back contact of the cell permits in such cases to improve the electrical properties. Relative increases of up to 7.5% of fill factor and of 6.8% of conversion efficiency are shown for amorphous silicon cells deposited on highly textured substrates, together with improved yield and low-illumination performance.

Silicon Filaments in Silicon Oxide for Next-Generation Photovoltaics

Nanometer wide silicon filaments embedded in an amorphous silicon oxide matrix are grown at low temperatures over a large area. The optical and electrical properties of these mixed-phase nanomaterials can be tuned independently, allowing for advanced light management in high efficiency thin-film silicon solar cells and for band-gap tuning via quantum confinement in third-generation photovoltaics.

Efficient light management scheme for thin film silicon solar cells via transparent random nanostructures fabricated by nanoimprinting

We propose the use of transparent replicated random nanostructures fabricated via nanoimprinting on glass as next-generation superstrates for thin film silicon solar cells. We validate our approach by demonstrating short-circuit current densities for p-i-n hydrogenated microcrystalline silicon solar cells as high as for state-of-the-art nanotextured ZnO front electrodes. Our methodology opens exciting possibilities to integrate a large variety of nanostructures into p-i-n solar cells and allows to systematically investigate the influence of interface morphology on the optical and electronic properties of the device in order to further improve device performance.

Optimization of ZnO Front Electrodes for High-Efficiency Micromorph Thin-Film Si Solar Cells

The quest for increased performances in thin-film silicon micromorph tandem devices nowadays requires an increase of current density. This can be achieved with thin cells by combining both robust cell design and efficient light management schemes. In this paper, we identify three key requirements for the transparent conductive oxide electrodes. First, strong light scattering into large angles is needed on the entire useful wavelength range: A front electrode texture with large enough features is shown to grant a high total current (typically >26 mA/cm2 with a 2.4-μm-thick absorber material), while sharp features are reported to allow for high top cell current (>13 mA/cm2) and reduced reflection at the ZnO/Si interface. Second, sufficiently smooth substrate features are needed to guarantee a high quality of the silicon active material, ensuring good and stable electrical properties (typically Voc around 1.4 V). Third, conduction and transparency of electrodes must be cleverly balanced, requiring high transparent conductive oxide mobility (∼50 cm

ZnO Transparent conductive oxide for thin film silicon solar cells

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Light harvesting schemes for high efficiency thin film silicon solar cells

/V/s) to maintain the sheet resistance below 30 Ω/sq while keeping absorption as low as possible. Optimization of these three key requirements using ZnO electrodes allowed us to realize high-efficiency micromorph devices with 13.5% initial and 11.5% stabilized efficiency.

Single to multi-scale texturing for high efficiency micromorph thin film silicon solar cell

There is general agreement that the future production of electric energy has to be renewable and sustainable in the long term. Photovoltaic (PV) is booming with more than 7GW produced in 2008 and will therefore play an important role in the future electricity supply mix. Currently, crystalline silicon (c-Si) dominates the market with a share of about 90%. Reducing the cost per watt peak and energy pay back time of PV was the major concern of the last decade and remains the main challenge today. For that, thin film silicon solar cells has a strong potential because it allies the strength of c-Si (i.e. durability, abundancy, non toxicity) together with reduced material usage, lower temperature processes and monolithic interconnection. One of the technological key points is the transparent conductive oxide (TCO) used for front contact, barrier layer or intermediate reflector. In this paper, we report on the versatility of ZnO grown by low pressure chemical vapor deposition (ZnO LP-CVD) and its application in thin film silicon solar cells. In particular, we focus on the transparency, the morphology of the textured surface and its effects on the light in-coupling for micromorph tandem cells in both the substrate (n-i-p) and superstrate (p-i-n) configurations. The stabilized efficiencies achieved in Neuchâtel are 11.2% and 9.8% for p-i-n (without ARC) and n-i-p (plastic substrate), respectively.

High rate deposition of microcrystalline silicon with silicon oxide doped layers: Highlighting the competing roles of both intrinsic and extrinsinc defects on the cells performances

In Thin Film Silicon (TF-Si) solar cells light harvesting schemes must guarantee an efficient light trapping in the thin absorber layers without decreasing the silicon layers quality and consecutively the p-i-n diodes electrical performance. TF-Si solar cells resilience to the substrate roughness is reported to be possibly improved through optimizations of the cell design and of the silicon deposition processes. By further tailoring the superstrate texture, amorphous silicon / microcrystalline silicon (a-Si:H/μc-Si:H) tandem solar cells with an initial efficiency up to 13.7 % and a stabilized efficiency up to 11.8 % are demonstrated on single-scale textured superstrates. An alternative approach combining large and smooth features nanoimprinted onto a transparent lacquer with small and sharp textures from as-grown LPCVD ZnO is then shown to have a high potential for further increasing TF-Si devices efficiency. First results demonstrate up to 14.1 % initial efficiency for a TF-Si tandem solar cell.

Optimization of thin film silicon solar cells on highly textured substrates

Improving micromorph devices performances nowadays requires a current density increase: good devices typically exhibit an open circuit voltage times fill factor product of one (Voc×FF∼1.4V×0.71=1). Their short-circuit current density (Jsc) value thus dictates their efficiency (expressed in %). Maximizing it with reasonable cells thicknesses necessitates therefore combining robust cell design with adequate light management through transparent electrodes and intermediate reflectors engineering. We will first show how record micromorph devices (13.5% initial and >11.5% stabilized efficiencies) are prepared on optimized single-layer ZnO electrodes. Such electrodes requirements will be discussed: 1) Strong and wide light scattering is needed on the entire useful wavelength range. Large features grant high total currents (>26mA/cm2) while sharp ones allow for high top cell currents (>13mA/cm2). 2) Sufficiently small or smooth substrate features permits high quality cell growth, providing good cell design (typically Voc over 1.4V). 3) Good conduction and transparency for electrodes (requiring ∼50cm2/V/s TCO mobility) should preserve sheet resistance close to 20Ω/□ (for FF>70%) with low absorption. We will then focus on pushing further micromorph devices potential. Either textured intermediate reflectors can fulfill the bottom cell needs, or double-texture substrates can be implemented: light scattering at large wavelengths is here achieved via nanoimprint lithography (a versatile approach to glass-texturing), topped by small and sharp ZnO features guaranteeing high top cell current. By combining excellent TCO with smart under-structures, thin devices delivering high currents with excellent efficiencies are within reach.