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Dive into the research topics where Philippe Cormont is active.

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Featured researches published by Philippe Cormont.


Optics Express | 2009

Subsurface damage measurement of ground fused silica parts by HF etching techniques

Jerome Neauport; C. Ambard; Philippe Cormont; N. Darbois; J. Destribats; C. Luitot; O. Rondeau

Detection and measurement of subsurface damage of ground optical surfaces are of major concern in the assessment of high damage thresholds fused silica optics for high power laser applications. We herein detail a new principle of SSD measurement based on the utilization of HF acid etching. We also review and compare different subsurface damage (SSD) characterization techniques applied to ground and fine ground fused silica samples. We demonstrate good concordance between the different measurements.


Optics Express | 2009

Initiation of laser-induced damage sites in fused silica optical components

Bertrand Bertussi; Philippe Cormont; Stéphanie Palmier; Philippe Legros; Jean-Luc Rullier

Significant improvement in the polishing process of fused silica optical components has increased their lifetimes at 351 nm. Nevertheless, for large laser facilities like the LaserMegaJoule (LMJ), zero defect optical components are not yet available. Therefore, a damage mitigation technique has been developed to prevent the growth of the laser-initiated damage sites. Because of the difficulty to produce mitigated sites with sufficiently large depth, the initial morphology of damage to mitigate is a critical issue. The aim of this work is to determine laser parameters (pulse duration, fluence) which permit us to initiate damage sites in accordance with our mitigation process. Confocal microscopy is used to observe damage sites that have sub-surface cracks and consequently to measure precisely the diameter and the depth of the area to mitigate.


Optics Express | 2009

Investigation of stress induced by CO2 laser processing of fused silica optics for laser damage growth mitigation

Laurent Gallais; Philippe Cormont; Jean-Luc Rullier

Laser damage mitigation is a process developed to prevent the growth of nanosecond laser-initiated damage sites under successive irradiation. It consists of re-fusing the damage area with a CO2 laser. In this paper we investigate the stress field created around mitigated sites which could have an influence on the efficiency of the process. A numerical model of CO2 laser interaction with fused silica is developed. It takes into account laser energy absorption, heat transfer, thermally induced stress and birefringence. Residual stress near mitigated sites in fused silica samples is characterized with specific photoelastic methods and theoretical data are compared to experiments. The stress distribution and quantitative values of stress levels are obtained for sites treated with the CO2 laser in various conditions of energy deposition (beam size, pulse duration, incident power). The results provided evidence that the presence of birefringence/residual stress around the mitigated sites has an effect on their laser damage resistance.


Optics Express | 2010

Impact of two CO(2) laser heatings for damage repairing on fused silica surface.

Philippe Cormont; Laurent Gallais; L. Lamaignère; Jean-Luc Rullier; Patrick Combis; D. Hébert

CO(2) laser is an interesting tool to repair defects on silica optics. We studied UV nanosecond laser-induced damage in fused silica after CO(2) laser heating. The localization of damage sites and the laser damage threshold are closely related to stress area in silica induced by heating. By applying a suitable second laser heating, we managed to eliminate the debris issued from redeposited silica and to modify the stress area. As a consequence, a significant increase of laser resistance has been observed. This process offers the possibility to improve damage repairing sufficiently to extend the lifetime of the silica components.


Optics Express | 2013

Removal of scratches on fused silica optics by using a CO 2 laser

Philippe Cormont; Patrick Combis; Laurent Gallais; Christophe Hecquet; L. Lamaignère; Jean-Luc Rullier

We investigate the efficiency of local CO₂laser processing of scratches on silica optics in order to enhance the nanosecond UV-laser damage resistance. The surface deformations induced by the process have been measured for different CO₂laser parameters and then the pulse duration and the beam diameter have been chosen accordingly to limit those deformations below 1 µm. From the study of the laser damage resistance as a function of different material modifications we identify a range of optimal radiation parameters allowing a complete elimination of scratches associated with a high threshold of laser damage. Calculation of the temperature of silica using a two-dimensional axi-symmetric code was compared with experiment, supporting an optimization of the laser parameter as a function of the maximal dimensions of scratches that could be removed by this process.


Boulder Damage Symposium XL Annual Symposium on Optical Materials for High Power Lasers | 2008

Effect of the temporal pulse duration on the initiation of damage sites on fused silica surfaces

B. Bertussi; Philippe Cormont; S. Palmier; Gael Gaborit; L. Lamaignère; P. Legros; Jean-Luc Rullier

The lifetime of silica optics in high power laser facility as the Laser MégaJoule (LMJ) is typically limited by the initiation of surface damages and their subsequent growth. To prevent this problem, a mitigation technique is used: it consists in a local melting of silica by CO2 laser irradiation on the damage site. Because of the difficulty to produce efficient mitigated sites with large depth, the characterization of damage site to mitigate is very important. In this context, confocal microscopy appears to be an efficient solution to detect precisely cracks present under the damage site.


Scientific Reports | 2018

Understanding the effect of wet etching on damage resistance of surface scratches

Benoit Da Costa Fernandes; Mathilde Pfiffer; Philippe Cormont; Marc Dussauze; Bruno Bousquet; Evelyne Fargin; Jerome Neauport

Fused silica optics often exhibit surface scratches after polishing that radically reduce their damage resistance at the wavelength of 351u2009nm in the nanosecond regime. Consequently, chemical treatments after polishing are often used to increase the damage threshold and ensure a safe operation of these optics in large fusion-scale laser facilities. Here, we investigate the reasons for such an improvement. We study the effect of an HF-based wet etching on scratch morphology and propose a simple analytic model to reflect scratch widening during etching. We also use a finite element model to evaluate the effect of the morphological modification induced by etching on the electric field distribution in the vicinity of the scratch. We evidence that this improvement of the scratch damage resistance is due to a reduction of the electric field enhancement. This conclusion is supported by secondary electron microscopy (SEM) imaging of damage sites initiated on scratches after chemical treatment.


SPIE Optifab | 2015

Process for repairing large scratches on fused silica optics

Philippe Cormont; Antoine Bourgeade; Sandy Cavaro; Thomas Doualle; Gael Gaborit; Laurent Gallais; Jean-Luc Rullier; Daniel Taroux

Scratches at the surface of fused silica optics can be detrimental for the performance of optical systems because they initiate damage on the optic but also they perturb the amplitude or phase of the transmitted laser light. Removing scratches by conventional polishing techniques can be time consuming as it is an iterative and long process, especially when hours of polishing time are required to obtain very high surface accuracy. So we have investigated ways to remove them with local laser processing. The silica is then heated at temperature higher than the softening point to heal the cracks.


Laser-Induced Damage in Optical Materials: 2015 | 2015

Heat treatment of fused silica optics repaired by CO2 laser

Thomas Doualle; Laurent Gallais; Philippe Cormont; Jean-Luc Rullier

In the context of high power laser applications, we study the effect of a heat treatment on CO2 laser mitigation of laser damage sites on fused silica samples. The isothermal annealing in a furnace is investigated and then compared to the local annealing by CO2 laser irradiation that is applied to enhance laser damage resistance on mitigated sites. Before and after isothermal annealing, we study the sites morphology, the evolution of residual stress and the laser-induced damage threshold measured at 355nm, 3ns. The results show that the initial laser damage probabilities were significantly improved after annealing at 1050°C for 12 hours. These results are compared to simulations with a thermo-mechanical model based on finite-element method.


Laser-Induced Damage in Optical Materials: 2014 | 2014

Simulations of CO2 laser interaction with silica and comparison to experiments

Thomas Doualle; Laurent Gallais; Philippe Cormont; D. Hébert; Patrick Combis; Jean-Luc Rullier

Localized CO2 laser heating of silica glass has demonstrated its ability to mitigate surface damage on optics used for high power laser applications. The parameters for this process such as the power, the beam size and the exposition time are however critical and some fundamental studies on the silica behavior under CO2 laser irradiation are required to develop the processes. It is necessary for instance to understand the silica transformation, the material ejection and the thermo-mechanical stresses induced by the laser heating and subsequent cooling. A thermo-mechanical model based on finite-element method has been used to calculate the temperature of silica heated by CO2 laser irradiation and the residual stress after cooling of the samples. The model, as the different parameters used for calculations, are detailed in this paper and the numerical results are compared to different dedicated experimental studies.

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Laurent Gallais

École Normale Supérieure

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Thomas Doualle

Aix-Marseille University

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Antoine Bourgeade

French Alternative Energies and Atomic Energy Commission

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