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Qiqing C. Ouyang

IBM

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Publication

Featured researches published by Qiqing C. Ouyang.

Archive | 2014

Finfet circuits with various fin heights

Qiqing C. Ouyang; Pranita Kerber

Archive | 2015

FINFET DEVICE HAVING A MERGED SOURCE DRAIN REGION UNDER CONTACT AREAS AND UNMERGED FINS BETWEEN CONTACT AREAS, AND A METHOD OF MANUFACTURING SAME

Pranita Kerber; Qiqing C. Ouyang

Archive | 2013

REDUCED RESISTANCE SiGe FinFET DEVICES AND METHOD OF FORMING SAME

Pranita Kerber; Qiqing C. Ouyang

Archive | 2016

Finfet device with vertical silicide on recessed source/drain epitaxy regions

Keith E. Fogel; Pranita Kerber; Qiqing C. Ouyang

Archive | 2016

SiGe FINFET WITH IMPROVED JUNCTION DOPING CONTROL

Pranita Kerber; Qiqing C. Ouyang

Archive | 2013

FinFET DEVICE INCLUDING FINS HAVING A SMALLER THICKNESS IN A CHANNEL REGION, AND A METHOD OF MANUFACTURING SAME

Pranita Kerber; Qiqing C. Ouyang

Archive | 2015

SEMICONDUCTOR DEVICE INCLUDING GATE CHANNEL HAVING ADJUSTED THRESHOLD VOLTAGE

Pranita Kerber; Qiqing C. Ouyang

Archive | 2017

Structure and method for tensile and compressive strained silicon germanium with same germanium concentration by single epitaxy step

Pranita Kerber; Qiqing C. Ouyang; Dominic J. Schepis

Archive | 2017

SEMICONDUCTOR DEVICE INCLUDING EPITAXIALLY FORMED BURIED CHANNEL REGION

Jie Deng; Pranita Kerber; Qiqing C. Ouyang

Archive | 2016

REDUCED RESISTANCE SHORT-CHANNEL InGaAs PLANAR MOSFET

Pranita Kerber; Qiqing C. Ouyang

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Pranita Kerber

IBM

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Dominic J. Schepis

IBM

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Jie Deng

IBM

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Keith E. Fogel

IBM

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