Rajesh Odedra | Researchain

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Archive | 2012

Precursors for Plasma Activated Conformal Film Deposition

Adrien Lavoie; Mark Saly; Daniel Moser; Rajesh Odedra; Ravi Kanjolia

Archive | 2000

Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites

Megan Ravetz; Graham Williams; Andrew John Dudley Nelson; Roy Trevor Blunt; Howard Williams; Rajesh Odedra

Archive | 2001

Process and apparatus for the isolation of pure, or substantially pure, organometallic compounds

Rajesh Odedra; Megan Ravetz; Graham Williams; Phillip Reeve Jacobs

Archive | 2008

Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors

Peter Nicholas Heys; Andrew Kingsley; Fuquan Song; Paul A. Williams; Thomas Leese; Hywel O. Davies; Rajesh Odedra

Archive | 2009

Hafnium and zirconium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films

Peter Nicholas Heys; Rajesh Odedra; Andrew Kingsley; Hywel Owen Davies

Archive | 2009

Titanium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films

Peter Nicholas Heys; Rajesh Odedra; Andrew Kingsley; Hywel O. Davies

Archive | 2005

Precursors for deposition of silicon nitride, silicon oxynitride and metal silicon oxynitrides

Anthony C. Jones; Megan Ravetz; Paul A. Williams; Ravi Kanjolia; Rajesh Odedra

Archive | 2010

Compositions and methods of use for forming titanium- containing thin films

Peter Nicholas Heys; Rajesh Odedra; Andrew Kingsley

Archive | 2011

Method for bulk supply of organometallic precursor to a plurality of epitaxial reactor sites

Roy Trevor Blunt; Andrew John Dudley Nelson; Rajesh Odedra; Megan Ravetz; Graham Williams; Howard Williams; グラハムウィリアムズ; ハワードウイリアムズ; ラジェシュオデッドラ; アンドリューネルソン; ロイトレバーブラント; メーガンラビッツ

Archive | 2000