Rajesh Odedra

Precursors for Plasma Activated Conformal Film Deposition

Method and apparatus for delivering precursors to a plurality of epitaxial reactor sites

Process and apparatus for the isolation of pure, or substantially pure, organometallic compounds

Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors

Hafnium and zirconium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films

Titanium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films

Precursors for deposition of silicon nitride, silicon oxynitride and metal silicon oxynitrides

Compositions and methods of use for forming titanium- containing thin films

Method for bulk supply of organometallic precursor to a plurality of epitaxial reactor sites

An apparatus for the delivery of precursors in the vapour phase to epitaxial reactor sites