Ramanujapuram A. Srinivas
Applied Materials
Network
Latest external collaboration on country level. Dive into details by clicking on the dots.
Publication
Featured researches published by Ramanujapuram A. Srinivas.
Process, equipment, and materials control in integrated circuit manufacturing. Conference | 1999
Mohan K. Bhan; Frederick Wu; Ramanujapuram A. Srinivas; Brian Metzger; Zvi Lando; Murali Narasimhan; Fusen E. Chen
The TiCl4 based CVD-Ti process has been identified as the candidate of choice for the advanced contact metallization. A BKM wet clean recovery (WCR) procedure, involving extended chamber seasoning, has been developed for the CVD-Ti process. The new WCR methodology takes only 5 wafer processing to stabilize the CVD-Ti chamber condition and film properties. It has been found that a chamber seasoning for 200 sec, performed after every idle time (greater than 15 min.) and thermal periodic clean (at wafer count # 200), helps to maintain the CVD-Ti process performance. The reliability of the new chamber operating procedures was validated through a successful 3000 wafer marathon demonstration.
Archive | 2001
Jeong Soo Byun; Lin Yin; Frederick C. Wu; Ramanujapuram A. Srinivas; Avgerinos V. Gelatos; Alfred Mak; Mei Chang; Moris Kori; Ashok K. Sinha
Archive | 2000
Ramanujapuram A. Srinivas; Brian Metzger; Shulin Wang; Frederick C. Wu
Archive | 1996
Meng Chu Tseng; Mei Chang; Ramanujapuram A. Srinivas; Klaus-Dieter Rinnen; M. Eizenberg; Susan Telford
Archive | 1998
Mei Chang; Ramanujapuram A. Srinivas; Li Wu
Archive | 1997
Israel Beinglass; Ramanujapuram A. Srinivas
Archive | 2000
Ramanujapuram A. Srinivas; Mohan K. Bhan; Jennifer Kopp
Archive | 1999
Shulin Wang; Ming Xi; Frederick Wu; Ramanujapuram A. Srinivas; Yehuda Demayo; Zvi Lando; Mei Chang; Russell C. Ellwanger
Archive | 2001
Truc T. Tran; Ramanujapuram A. Srinivas; Hong Bee Teoh; Vgerinos Jerry A. Gelatos; Marlon E. Menezes; Vicky Nguyen; Yehuda Demayo; Rommel Ruiz
Archive | 1996
Israel Beinglass; Ramanujapuram A. Srinivas
