Randall C. Hildenbrand

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Archive | 1988

Wafer processing apparatus having independently controllable energy sources

Cecil J. Davis; Rhett B. Jucha; Joseph D. Luttmer; Rudy L. York; Lee M. Loewenstein; Robert T. Matthews; Randall C. Hildenbrand

Archive | 1992

Processing method using both a remotely generated plasma and an in-situ plasma with UV irradiation

Cecil J. Davis; Rhett B. Jucha; Joseph D. Luttmer; Rudy L. York; Lee M. Loewenstein; Robert T. Matthews; Randall C. Hildenbrand

Archive | 1984

Automated single slice powered load lock plasma reactor

Cecil J. Davis; John E. Spencer; Dan T. Hockersmith; Randall C. Hildenbrand; Frederick W. Brown; Stanford P. Kohan

Archive | 1987

Semiconductor wafer transfer method and arm mechanism

Cecil J. Davis; Robert T. Matthews; Randall C. Hildenbrand

Archive | 1984

Powered load lock electrode/substrate assembly including robot arm, optimized for plasma process uniformity and rate

John E. Spencer; Randall E. Johnson; Dan T. Hockersmith; Randall C. Hildenbrand; John I. Jones; William S. Jaspersen

Archive | 1986

Vacuum processing system and method

Duane E. Carter; Cecil J. Davis; Randall C. Hildenbrand; Robert T. Matthews; John E. Spencer; Timothy A. Wooldridge

Archive | 1998

Wafer transfer arm and method

Cecil J. Davis; Timothy A. Wooldridge; Duane E. Carter; John E. Spencer; Robert T. Matthews; Randall C. Hildenbrand

Archive | 1988

Apparatus and method for manufacturing integrated circuit & other electronic equipment

Cecil J. Davis; Rhert B Jucha; Joseph D. Luttmer; Ludy L York; Lee M. Loewenstein; Robert T. Matthews; Randall C. Hildenbrand

Archive | 1993

Wafer transfer method and wafer processing module

Duane E. Carter; Cecil J. Davis; Randall C. Hildenbrand; Robert T. Matthews; John E. Spencer; Timothy A. Wooldridge; イー．スペンサージヨン; ジエイ．デービスセシル; エイ．ウールドリツジテイモシイ; イー．カータードユアン; シー．ヒルデンブランドランドール; マチユーズロバート

Archive | 1986