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Ravi K. Laxman

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Publication

Featured researches published by Ravi K. Laxman.

Archive | 2007

Method and apparatus to help promote contact of gas with vaporized material

John Gregg; Scott Battle; Jeffrey I. Banton; Donn Naito; Ravi K. Laxman

Archive | 2002

Low-K dielectric thin films and chemical vapor deposition method of making same

Ravi K. Laxman; Chongying Xu; Thomas H. Baum

Archive | 2002

Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride

Ziyun Wang; Chongying Xu; Ravi K. Laxman; Thomas H. Baum; Bryan C. Hendrix; Jeffrey F. Roeder

Archive | 2004

Low dielectric constant thin films and chemical vapor deposition method of making same

Ravi K. Laxman; Chongying Xu; Thomas H. Baum

Archive | 2001

Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films

Chongying Xu; Thomas H. Baum; Alexander S. Borovik; Ziyun Wang; James T. Y. Lin; Scott Battle; Ravi K. Laxman

Archive | 2003

Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films

Tianniu Chen; Chongying Xu; Thomas H. Baum; Ravi K. Laxman; Alexander S. Borovik

Archive | 2004

Stabilisierte Cyclosiloxane zur Verwendung als Vorläufer für Dünnfilme mit niedriger dielektrischer Konstante

Thomas H. Baum; Alexander S. Borovik; Tianniu Rocky Hill Chen; Ravi K. Laxman; Chongying New Milford Xu

Archive | 2015

Method and apparatus for helping promotion of contact between gas and vaporized material

グレッグ，ジョン; John Gregg; バトル，スコット; Scott Battle; バントン，ジェフリー，アイ．; Jeffrey I. Banton; ナイト，ドン; Donn Naito; ラックスマン，ラビ，ケイ．; Ravi K. Laxman

Archive | 2005

Procede et dispositif destines a favoriser le contact entre du gaz et un materiau vaporise

John Gregg; Scott Battle; Jeffry I. Banton; Donn Naito; Ravi K. Laxman

Archive | 2005

Verfahren und vorrichtung zur förderung des kontakts von gas mit verdampftem material

John Gregg; Scott Battle; Jeffry I. Banton; Donn Naito; Ravi K. Laxman

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Collaboration

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Thomas H. Baum

IBM

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Chongying Xu

University of New Mexico

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Ziyun Wang

Air Liquide

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Donn Naito

Entegris

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John Gregg

Entegris

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Scott Battle

Entegris

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Jeffrey F. Roeder

Bethel University

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Bryan C. Hendrix

Infineon Technologies

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Tianniu Chen

University of Tennessee

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