Robert Bernath

High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

Light sources based on laser plasmas using tin as target material are known to provide high conversion efficiency of laser power to emission in the 13.5 nm spectral region. In addition, laser plasmas produced from microscopic droplet targets enable the utilization of the mass-limited concept which minimizes the effect of target debris produced from the laser plasma interaction. By combining the mass-limited target concept and tin as the choice of target material, we are developing an extreme-ultraviolet (EUV) light source that can supply high power while remaining essentially debris-free. This source uses tin-doped microscopic droplet liquid targets that are generated at high-repetition rates (>30 kHz), which allows convenient upward power scaling when coupled with a high averaged-power laser. Detailed studies of the radiation from this source have been made using a precision Nd:YAG laser. Broad parametric studies of the conversion efficiency along with in-band spectroscopy of this EUV source have been performed. The parametric dependence of conversion efficiency is established based on measurements made by the Flying Circus diagnostic tool and a calibrated high-resolution flat-field spectrometer. These measurements have been independently confirmed by the Flying Circus 2 team.

Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas

Detailed spectroscopic studies on extreme UV emission from laser plasmas using tin and lithium planar solid targets were completed. At 13.5 nm, the best conversion efficiency (CE) for lithium was found to be 2.2% at intensities near 7 x 10(10) W/cm(2). The highest CE measured for tin was near 5.0% at an intensity close to 1 x 10(11) W/cm(2).

Diagnostics for laser plasma EUV sources

A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the principal diagnostics of the EUV radiation that are now being utilized in the metrology, spectroscopy and imaging of these sources.

EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas

The 13 nm emission that results from laser plasmas created from tin targets, results from a milliard of transitions occurring in many ions of tin (Sn6+-Sn13+). Understanding the energy manifolds within these multiple states will further our ability to manipulate energy into the narrow emission band demanded by EUV Lithography. A combined experimental theoretical program is underway to measure and interpret the detailed EUV emission spectra from laser plasmas suitable for EUVL, particularly mass-limited droplet laser plasmas. We employ high resolution spectroscopy in the 2 - 60 nm wavelength regions to characterize the emission from the plasma. This is interpreted with the aid of combined hydrodynamic/ radiation transport computer models. The results of this study will have impact on the in-band EUV conversion efficiency, estimation of the out-of-band short-wavelength emission, and in the development of electron temperature plasma diagnostics.

Remote femtosecond laser induced breakdown spectroscopy (LIBS) in a standoff detection regime

The need for robust, versatile, and rapid analysis standoff detection systems has emerged in response to the increasing threat to homeland security. Laser Induced Breakdown Spectroscopy (LIBS) has emerged as a novel technique that not only resolves issues of versatility, and rapid analysis, but also allows detection in settings not currently possible with existing methods. Several studies have shown that femtosecond lasers may have advantages over nanosecond lasers for LIBS analysis in terms of SNR. Furthermore, since femtosecond pulses can travel through the atmosphere as a self-propagating transient waveguide, they may have advantages over conventional stand-off LIBS approaches1. Utilizing single and multiple femtosecond pulse laser regimes, we investigate the potential of femtosecond LIBS as a standoff detection technology. We examine the character of UV and visible LIBS from various targets of defense and homeland security interest created by channeled femtosecond laser beams over distances of 30m or more.

Detection and analysis of RF emission generated by laser-matter interactions

Plasmas produced by laser-matter interactions are a known source of electromagnetic radiation. However, little has been done to systematically study the electromagnetic radiation emitted from laser produced plasmas. It is our intent to provide detailed time and frequency domain measurements of such emitted radiation. An ultra-fast femtosecond high intensity laser and a superheterodyne receiver are employed to study laser-matter interactions for various materials in the frequency range 1-40GHz.

Femtosecond ablation scaling for different materials

We are making a comprehensive study of the ablation of elemental materials by femtosecond lasers. Specifically, we are examining the ablation of a wide range of metals, under vacuum and in ambient air, using 850-nm wavelength, 100-fs laser pulses in an intensity range approaching and extending beyond the air ionization threshold. We compare ablation rates and examine in detail the morphology and structural integrity of the ablation region, towards gaining greater knowledge of the interaction science as well as constructing empirical models for fabrication guidelines across the periodic table.

Dynamics of Mass-Limited Laser Plasma Targets as Sources for Extreme Ultraviolet Lithography

The droplet laser plasma source has many attractive features as a continuous, almost debris-free source for extreme ultraviolet (EUV) and X-ray radiation applications. In a combined experimental and theoretical study, we are analyzing the interaction physics between the laser light and microscopic spherical liquid droplet targets over a range of conditions.

Increase of ablation rate using burst mode femtosecond pulses

We investigate the ablation rates of metals and dielectrics using a Ti:sapphire oscillator. Prior work on burst ablation has been performed using high-power lasers and significant increases were observed. These two modalities will be compared.

EUV generation from lithium laser plasma for lithography

Hydrogen-like line emission from lithium has long been considered a candidate for EUV light source for lithography. We have completed the evaluation of the potential of lithium as a laser-plasma source, both theoretically and experimentally. Theoretical calculations show optimum intensity region for lithium for attaining high conversion is close to 5.0 x 1011 W/cm2, with plasma temperature near 50 eV. Experimental studies compare directly, the conversion efficiency and optimum irradiation conditions for both planar tin and lithium solid targets. Best conversion efficiency found in this study is 2% for lithium, while CE measured is better than 4% for tin target at identical experimental conditions.