Simi George

High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

Light sources based on laser plasmas using tin as target material are known to provide high conversion efficiency of laser power to emission in the 13.5 nm spectral region. In addition, laser plasmas produced from microscopic droplet targets enable the utilization of the mass-limited concept which minimizes the effect of target debris produced from the laser plasma interaction. By combining the mass-limited target concept and tin as the choice of target material, we are developing an extreme-ultraviolet (EUV) light source that can supply high power while remaining essentially debris-free. This source uses tin-doped microscopic droplet liquid targets that are generated at high-repetition rates (>30 kHz), which allows convenient upward power scaling when coupled with a high averaged-power laser. Detailed studies of the radiation from this source have been made using a precision Nd:YAG laser. Broad parametric studies of the conversion efficiency along with in-band spectroscopy of this EUV source have been performed. The parametric dependence of conversion efficiency is established based on measurements made by the Flying Circus diagnostic tool and a calibrated high-resolution flat-field spectrometer. These measurements have been independently confirmed by the Flying Circus 2 team.

Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas

Detailed spectroscopic studies on extreme UV emission from laser plasmas using tin and lithium planar solid targets were completed. At 13.5 nm, the best conversion efficiency (CE) for lithium was found to be 2.2% at intensities near 7 x 10(10) W/cm(2). The highest CE measured for tin was near 5.0% at an intensity close to 1 x 10(11) W/cm(2).

Laser plasma EUVL sources: progress and challenges

The most pressing technical issue for the success of EUV lithography is the provision of a high repetition-rate source having sufficient brightness, lifetime, and with sufficiently low off-band heating and particulate emissions characteristics to be technically and economically viable. We review current laser plasma approaches and achievements, with the objective of projecting future progress and identifying possible limitations and issues requiring further investigation.

13.5 nm EUV generation from tin-doped droplets using a fiber laser

A comprehensive study of the spectral and Mo-Si mirror inband EUV emission from tin-doped droplet laser plasma targets irradiated with a single 1064 nm beam from an Yb:doped fiber laser is reported.With pre-pulse enhancement, in-band conversion efficiency of approximately 2.1% is measured for laser irradiance intensities near 8 x 10(10) W/cm(2). This is the first study to be reported that uses a high-power, high repetition rate fiber laser with the high repetition rate droplet targets where EUV generation from plasmas is measured.

Diagnostics for laser plasma EUV sources

A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the principal diagnostics of the EUV radiation that are now being utilized in the metrology, spectroscopy and imaging of these sources.

EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas

The 13 nm emission that results from laser plasmas created from tin targets, results from a milliard of transitions occurring in many ions of tin (Sn6+-Sn13+). Understanding the energy manifolds within these multiple states will further our ability to manipulate energy into the narrow emission band demanded by EUV Lithography. A combined experimental theoretical program is underway to measure and interpret the detailed EUV emission spectra from laser plasmas suitable for EUVL, particularly mass-limited droplet laser plasmas. We employ high resolution spectroscopy in the 2 - 60 nm wavelength regions to characterize the emission from the plasma. This is interpreted with the aid of combined hydrodynamic/ radiation transport computer models. The results of this study will have impact on the in-band EUV conversion efficiency, estimation of the out-of-band short-wavelength emission, and in the development of electron temperature plasma diagnostics.

High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets

In this paper we report the development of nanosecond-pulsed fiber laser technology for the next generation EUV lithography sources. The demonstrated fiber laser system incorporates large core fibers and arbitrary optical waveform generation, which enables achieving optimum intensities and other critical beam characteristics on a laser-plasma target. Experiment demonstrates efficient EUV generation with conversion efficiency of up to 2.07% for in-band 13.5-nm radiation using mass-limited Sn-doped droplet targets. This result opens a new technological path towards fiber laser based high power EUV sources for high-throughput lithography steppers.

Ion emission measurements and mirror erosion studies for extreme ultraviolet lithography

Mirror erosion by high energy ion emission from extreme UV light sources is one of the main factors contributing to EUVL collector mirror reflectivity degradation. We are measuring ion energy distributions at the mirror distance from the plasma utilizing three different ion diagnostics for the case of tin-doped microscopic droplet laser plasmas. Typical ion energy distributions measured by an electrostatic spectrometer are described. From the ion energy distributions, an estimate of mirror erosion is obtained. The effectiveness of electrostatic field mitigation is evaluated for the EUVL source requirement.

EUV generation from lithium laser plasma for lithography

Hydrogen-like line emission from lithium has long been considered a candidate for EUV light source for lithography. We have completed the evaluation of the potential of lithium as a laser-plasma source, both theoretically and experimentally. Theoretical calculations show optimum intensity region for lithium for attaining high conversion is close to 5.0 x 1011 W/cm2, with plasma temperature near 50 eV. Experimental studies compare directly, the conversion efficiency and optimum irradiation conditions for both planar tin and lithium solid targets. Best conversion efficiency found in this study is 2% for lithium, while CE measured is better than 4% for tin target at identical experimental conditions.

Spectroscopy of Nd-doped laser materials

Laser design codes utilize laser properties provided by materials manufacturers for performance modeling. Large scale manufacturing of materials during compositional developments for a particular laser design is not economically feasible. Nevertheless, the laser properties derived from the available sample volumes must be reliable and reproducible. In recent years, as a result of the renewed interest in novel glasses for ultrafast laser applications, SCHOTT has developed improved measurements and methodologies for providing the most accurate information possible to laser scientists. Even though the J-O method is robust and time tested for the spectroscopic characterization of Nd3+, the accuracy of the results requires reliable measurements. This paper outlines the J-O approximation for manifold to manifold transitions, measurements needed, and some of the pitfalls to watch for during the collection of data for Nd-doped materials.