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Featured researches published by Robert M. Vyne.


Archive | 2000

Wafer support system

Michael W. Halpin; Mark R. Hawkins; Derrick W. Foster; Robert M. Vyne; John F. Wengert; Cornelius A. van der Jeugd; Loren R. Jacobs; Frank van Bilsen; Matthew G. Goodman; Hartmann Glenn; Jason M. Layton


Archive | 1996

Process chamber with inner support

John F. Wengert; Loren R. Jacobs; Michael W. Halpin; Derrick W. Foster; Cornelius A. van der Jeugd; Robert M. Vyne; Mark R. Hawkins


Archive | 2005

Substrate support system for reduced autodoping and backside deposition

Matt Goodman; Jereon Stoutyesdijk; Ravinder Aggarwal; Mike Halpin; Tony J. Keeton; Mark R. Hawkins; Lee Haen; Armand P. Ferro; Paul D. Brabant; Robert M. Vyne; Gregory M. Bartlett; Joe P. Italiano; Bob Haro


Archive | 1997

Method and system for adjusting semiconductor processing equipment

Mark R. Hawkins; Robert M. Vyne; Cornelius A. van der Jeugd


Archive | 2000

Process chamber with downstream getter plate

John F. Wengert; Loren R. Jacobs; Michael W. Halpin; Derrick W. Foster; Cornelius A. van der Jeugd; Robert M. Vyne; Mark R. Hawkins


Archive | 2008

Porous substrate holder with thinned portions

Matthew G. Goodman; Robert M. Vyne


Archive | 1998

Temperature control system for wafer

Derrick W. Foster; Matthew No. Tempe Goodmann; Glenn Hartmann; Loren R. Jacobs; Jason M. Layton; Bilsen Frank B.M. No. Phoenix Van; Der Jeugd Cornelius A. Van; Robert M. Vyne; John F. Wengert


Archive | 2016

Plasma pre-clean module and process

John Tolle; Matthew G. Goodman; Robert M. Vyne; Eric Hill


Archive | 1991

Wafer support apparatus

Derrick W. Foster; Matthew G. Goodman; Michael W. Halpin; Glenn Hartmann; Mark R. Hawkins; Loren R. Jacobs; Jason M. Layton; Bilsen Frank B.M. No. Phoenix Van; Der Jeugd Cornelius A. Van; Robert M. Vyne; John F. Wengert


Archive | 2015

PLASMA PRE-CLEAN PROCESS

John Tolle; Matthew G. Goodman; Robert M. Vyne; Eric Hill

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