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Rodney C. Kistler

Cabot Corporation

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Publication

Featured researches published by Rodney C. Kistler.

Archive | 1997

Chemical mechanical polishing slurry useful for copper substrates

Vlasta Brusic Kaufman; Rodney C. Kistler

Archive | 1999

Chemical mechanical polishing slurry useful for copper/tantalum substrates

Vlasta Brusic Kaufman; Rodney C. Kistler; Shumin Wang

Archive | 1997

Chemical mechanical polishing slurry for metal layers and films

Debra Lynn Scherber; Vlasta Brusic Kaufman; Rodney C. Kistler; Brian L. Mueller; Christopher C. Streinz

Archive | 1999

Chemical mechanical polishing method useful for copper substrates

Vlasta Brusic Kaufman; Rodney C. Kistler

Archive | 2007

Chemical/mechanical polishing slurry useful for copper substrate

Vlasta Brusic Kaufman; Rodney C. Kistler; Shumin Wang; カウフマン，ブラスタ ブラシック; シー． キストラー，ロドニー; ワン，シュミン

Archive | 1997

Slurry for chemical and mechanical polishing used for metal layer and film

Vlasta Brusic Kaufman; Rodney C. Kistler; Brian L. Mueller; Debra Lynn Scherber; Christopher C. Streinz; シー．ストレンツ クリストファー; エル．シェーバー デブラ; エル．ミュラー ブライアン; ブルジク カウフマン ブラスタ; シー．キストラー ロドニー

Archive | 1997

Chemical mechanical polishing copper substrates

Vlasta Brusic Kaufman; Rodney C. Kistler; Shumin Wang

Archive | 1999

Pate a polir chimio-mecanique pour substrats de cuivre

Vlasta Brusic Kaufman; Rodney C. Kistler; Shumin Wang

Archive | 1999

Boue de polissage chimico-mecanique utilisee pour polir les substrats de cuivre/tantale

Vlasta Brusic Kaufman; Rodney C. Kistler; Shumin Wang

Archive | 1997

Suspension pour le polissage mécano-chimique de couches métalliques et de films

Debra Lynn Scherber; Vlasta Brusic Kaufman; Rodney C. Kistler; Brian L. Mueller; Christopher C. Streinz

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Collaboration

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Vlasta Brusic Kaufman

Cabot Corporation

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Shumin Wang

Cabot Corporation

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Brian L. Mueller

Cabot Corporation

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Christopher C. Streinz

Cabot Corporation

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Debra Lynn Scherber

Cabot Corporation

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