Christopher C. Streinz

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Featured researches published by Christopher C. Streinz.

Archive | 1997

Composition and slurry useful for metal CMP

Steven Grumbine; Christopher C. Streinz; Brian L. Mueller

Archive | 1997

Chemical mechanical polishing slurry for metal layers and films

Debra Lynn Scherber; Vlasta Brusic Kaufman; Rodney C. Kistler; Brian L. Mueller; Christopher C. Streinz

Archive | 1998

Polishing composition including an inhibitor of tungsten etching

Steven Grumbine; Christopher C. Streinz; Eric W. G. Hoglund

Archive | 1997

Fluoride additive containing chemical mechanical polishing slurry and method for use of same

Christopher C. Streinz; Brian L. Mueller; Michael A. Lucarelli; Max H. Walters

Archive | 1997

Composition and method for polishing rigid disks

Christopher C. Streinz; Matthew Neville; Steven Grumbine; Brian L. Mueller

Archive | 2000

Cmp composition containing silane modified abrasive particles

Steven Grumbine; Christopher C. Streinz; Shumin Wang

Archive | 2003

Polishing composition for metal CMP

Shumin Wang; Steven Grumbine; Christopher C. Streinz; Eric W. G. Hoglund

Archive | 2001

Catalytic reactive pad for metal cmp

Steven Grumbine; Christopher C. Streinz; Brian L. Mueller

Archive | 1997

Composition and slurry useful for metal chemical mechanical polishing(cmp)

Steven Grumbine; Brian L. Mueller; Christopher C. Streinz; シー．ストレインズクリストファー; ケー．グランバインスティーブン; エル．ミューラーブライアン

Archive | 1997

Slurry for chemical and mechanical polishing used for metal layer and film

Vlasta Brusic Kaufman; Rodney C. Kistler; Brian L. Mueller; Debra Lynn Scherber; Christopher C. Streinz; シー．ストレンツクリストファー; エル．シェーバーデブラ; エル．ミュラーブライアン; ブルジクカウフマンブラスタ; シー．キストラーロドニー

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