Sahwan Hong

Large resistive switching in ferroelectric BiFeO3 nano-island based switchable diodes

O N The demand for non-volatile memory technologies that offer high speed, high storage density and low power consumption has stimulated extensive research into new functional materials and device physics. [ 1–5 ] Nano-ferronic devices based on multiferroic/ferroelectric materials have been emerging as nextgeneration nano-electronics, which deal with the interplay between ferroic orders (e.g. ferroelectricity and ferromagnetism) and electronic transport on the nanoscale. [ 6 ] Recent investigations into various multiferroic/ferroelectric materials have revealed remarkable polarization dependent electronic transport properties, which include signifi cant electroresistance effects in a switchable ferroelectric diode [ 7–11 ] and multiferroic/ferroelectric tunnel junctions (M/FTJs) [ 12–17 ] and intriguing charge conduction in ferroelectric domain/walls. [ 18 , 19 ] These conduction properties can be utilized for fast and non-destructive readout in emergent non-volatile memories such as resistive random access memory (RRAM) and memristor. [ 20 ] Especially, ferroelectric-resistive memories based on ferroelectric diode and tunnel junctions have demonstrated that it is possible to achieve high resistive ON/OFF ratio, high speed and low write power with a high reproducibility by controlling ferroelectric polarization. In a switchable ferroelectric diode, the Schottky-to-Ohmic contacts, forming at the interfaces between metal electrodes and semiconducting ferroelectric thin fi lms, are reversibly

Different resistance switching behaviors of NiO thin films deposited on Pt and SrRuO3 electrodes

We have compared resistance switching of NiO films deposited on Pt and SrRuO3 (SRO): unipolar switching in Pt/NiO/Pt and bipolar switching in Pt/NiO/SRO. Linear fitted current-voltage curves and capacitance-voltage results show that on- and off-states conductions in unipolar switching are dominated by inductive Ohmic behavior and Poole–Frenkel effect, respectively. However, the conductions of on- and off-states in bipolar switching follow capacitive Ohmic behavior and Schottky effect, respectively. Therefore, we infer that the mechanisms of the unipolar and bipolar switching behaviors in NiO films are related with changes in bulk-limited filamentary conduction and interfacial Schottky barrier, respectively.

Resistive switching transition induced by a voltage pulse in a Pt/NiO/Pt structure

We have observed a switching transition between bistable memory switching and monostable threshold switching in Pt/NiO/Pt structure. Bistable memory switching could be changed to monostable threshold switching by applying a positive electrical pulse with height of 2 V and width between 10−2 and 10−4 s. The change is reversible by applying a negative electrical pulse with the same height and width. By considering polarity- and width-dependence of the switching transition and compositional difference on electrical properties in NiOx, we have proposed a model in which the migration of oxygen ions (O2−) is responsible for the switching transition in Pt/NiO/Pt structures.

Electro-optic characteristics of 4-domain vertical alignment nematic liquid crystal display with interdigital electrode

We have fabricated a vertically aligned 4-domain nematic liquid crystal display cell with thin film transistor. Unlike the conventional method constructing 4-domain, i.e., protrusion and surrounding electrode which needs additional processes, in this study the pixel design forming 4-domain with interdigital electrodes is suggested. In the device, one pixel is divided into two parts. One part has a horizontal electric field in the vertical direction and the other part has a horizontal one in the horizontal direction. Such fields in the horizontal and vertical direction drive the liquid crystal director to tilt down in four directions. In this article, the electro-optic characteristics of cells with 2 and 4 domain have been studied. The device with 4 domain shows faster response time than normal twisted-nematic and in-plane switching cells, wide viewing angle with optical compensation film, and more stable color characteristics than 2-domain vertical alignment cell with similar structure.

Electrochemical growth and resistive switching of flat-surfaced and (111)-oriented Cu2O films

Flat-surfaced and fully (111)-oriented Cu2O films were grown through a chelate-assisted electrochemical approach. Based on key roles of chelating agent, the flat surface of films controlled over the columnar-grained growth was obtainable with a root-mean-square roughness value below 3 nm. Cu2O films treated by a rapid-thermal-annealing process at 200 °C exhibited unipolar switching I-V characteristics, presenting the bistable resistance states with a high resistance ratio (Roff/Ron) over 3 orders of magnitude and considerably stable switching properties within 100 switching cycles.

Coexistence of bi-stable memory and mono-stable threshold resistance switching phenomena in amorphous NbOx films

Both bi-stable memory and mono-stable threshold switching are observed in amorphous NbOx films. In addition, the transition between memory and threshold switching can be induced by changing external electrical stress. Raman spectroscopy and transmission electron microscope data show that the NbOx film is self-assembled into a layered structure consisting of a top metal-rich region and a bottom oxygen-rich region. The volume ratio of the two regions depends on the film thickness. Our experimental results suggest that different characteristics of conducting filaments in the two regions result in thickness dependence of switching types and the transition between memory and threshold switching.

Different nonvolatile memory effects in epitaxial Pt/PbZr0.3Ti0.7O3/LSCO heterostructures

We found different nonvolatile memory effects between ferroelectric and resistive switching in Pt/PbZr0.3Ti0.7O3(PZT)/La0.5Sr0.5CoO3 (LSCO) heterostructures, depending on thickness of epitaxial PZT films. As the film thickness decreased below 34 nm, leakage and/or tunneling currents increased and hindered ferroelectric switching of films; alternatively, bipolar resistive switching was observed. Analysis using fitting plot on resistive switching behaviors suggested that variable Schottky barrier at the interface between Pt electrode and the film may be responsible for the different nonvolatile memory switching.

Unipolar resistive switching mechanism speculated from irreversible low resistance state of Cu2O films

We observed cathode-interfaced electroreduction and a variation of oxygen content in an irreversible low resistance state of highly oriented cuprous oxide (Cu2O) films. These local microstructural and stoichiometric changes in hard breakdown of film allow speculation on the unipolar resistive switching mechanism: formation of metallic filaments originating from generation/migration of oxygen ions (O2−) from the cathode and release of oxygen gas through the anode. Based on the as-proposed switching model, endurance switching properties could be modulated from tens up to over 104 switching cycles by controlling ambient gas or the interface between Cu2O and anode.

Direct investigation on conducting nanofilaments in single-crystalline Ni/NiO core/shell nanodisk arrays

We report resistive switching characteristics of single-crystalline Ni/NiO core/shell nanodisk arrays, in which the conducting filaments are highly localized on the surface of nanostructure. The local current distributions observed in such a single-grained nanodisk demonstrate that the contact area and the contact time between the conductive tip of conducting atomic force microscopy and the surface of nanodisk critically influence the voltage-stress-induced electroforming behaviors of nanofilaments in NiO switching nanoblocks. These contact parameters, such as the contact area and the contact time, are interpreted to the electrode size and the voltage-stress time for the formation of filaments in metal oxides.

Layer-to-island growth of electrodeposited Cu2O films and filamentary switching in single-channeled grain boundaries

We investigated a growth behavior of highly oriented and columnar grained cuprous oxide (Cu2O) films, which were obtained through a chelate-assisted electrochemical solution approach. It was demonstrated that the electrochemical growth of Cu2O films followed a layer-to-island growth mode with a critical thickness of ∼190 nm. The chelating agent induced the layer-growth of flat-surfaced films consisting of single-crystalline planar grains, and influenced the preferred orientation of films maintained within the island-growth mode. In particular, the single-crystalline columnar grains with stable interfaces and diameters of 100–200 nm provided highly localized areas of linear grain boundaries for filamentary resistive switching. We measured different conduction behaviors of flat-surfaced films showing nonswitching Ohmic conduction and unipolar memory switching in as-deposited and annealed films, respectively. These different conduction behaviors were found to originate from the microstructure changes generat...