Sasson Somekh

Transverse mode control in a distributed feedback semiconductor laser

Transverse modes in a distributed feedback semiconductor laser are discussed. A scheme for discriminating these modes is suggested.

High speed replication of sub-micron features on large areas by X-ray lithography

We have developed, and describe herein, a new approach to X-ray lithography based on the use of X-rays with wavelengths of 4–6 A rather than the 8–34 A wavelength used in previous work. The principal advantage of the shorter wavelengths is that they allow the exposure system to have X-ray windows for increased throughput. We have achieved the replication of submicron size features in metal films using a 4.6 A Rh L α source, a new X-ray mask and new X-ray resist with high sensitivity to the shorter wavelengths and improved ion milling techniques.