Shifang Li

Controlling a fabrication tool using support vector machine

OPTIMIZATION OF RAY TRACING AND BEAM PROPAGATION PARAMETERS

AUTOMATED PROCESS CONTROL USING AN ADJUSTED METROLOGY OUTPUT SIGNAL

OPTIMIZING SENSITIVITY OF OPTICAL METROLOGY MEASUREMENTS

AUTOMATED PROCESS CONTROL USING PARAMETERS DETERMINED FROM A PHOTOMASK COVERED BY A PELLICLE

PROCESS CONTROL USING RAY TRACING-BASED LIBRARIES AND MACHINE LEARNING SYSTEMS

Scatterometry on pelliclized masks: an option for wafer fabs

DETERMINING ONE OR MORE PROFILE PARAMETERS OF A PHOTOMASK COVERED BY A PELLICLE

Determining transmittance of a photomask using optical metrology

Automated process control using optical metrology with a photonic nanojet