Shigeru Kokubo
Hitachi
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Publication
Featured researches published by Shigeru Kokubo.
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena | 2010
Keigo Kasuya; Souichi Katagiri; Takashi Ohshima; Shigeru Kokubo
Cold-field-emission current from a tungsten ⟨310⟩ emitter in a scanning electron microscope (SEM) gun, evacuated by an ion pump and a supplementary nonevaporative getter pump, was stabilized. It was verified that the probe current from a local (310) crystal plane exhibits different time variations in comparison to that of total current. As for the probe current under a pressure of 2×10−9 Pa, a stable plateau region—which lasted about 4 h—appeared just after flashing of the emitter. By observing emission patterns, it was verified that these different emission characteristics are originated from the anisotropy of current decay in accordance with crystal planes. With low-temperature “mild flashings” at 700 °C, the plateau region was extended to 12 h, which is long enough for practical SEM application. The superior properties of the plateau region, namely, high current, low noise, and small current variation, will enhance the performance and usability of electron microscopes.
Archive | 2012
Keigo Kasuya; Takashi Ohshima; Souichi Katagiri; Shigeru Kokubo; Hideo Todokoro
Archive | 2010
Shigeru Kokubo; Hisaya Murakoshi
Archive | 2011
Shigeru Kokubo; Hisaya Murakoshi; Hisao Nitta
Archive | 2011
Keigo Kasuya; Takashi Ohshima; Souichi Katagiri; Shigeru Kokubo; Hideo Todokoro
Archive | 2011
Shigeru Kokubo; Hisao Nitta; Hisaya Murakoshi
Archive | 2011
Shigeru Kokubo; Hisao Nitta; Hisaya Murakoshi
Archive | 2011
Shigeru Kokubo; Hisao Nitta; Hisaya Murakoshi
Archive | 2010
Shigeru Kokubo; Hisaya Murakoshi
Archive | 2010
Shigeru Kokubo; Hisaya Murakoshi