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Featured researches published by Shigeru Sakuma.


Applied Optics | 2000

Influence of sodium impurities on ArF excimer-laser-induced absorption in CaF 2 crystals

Norio Komine; Shigeru Sakuma; Masaki Shiozawa; Tsutomu Mizugaki; Eiji Sato

The formation of color centers induced by irradiation with ArF excimer lasers in CaF(2) crystals was found to depend strongly on the sodium impurity concentration. Sodium-related color centers were generated by two-photon absorption because the slope of the induced absorption coefficient just after irradiation started was proportional to the square of the laser fluence. The saturation absorption also depended on laser fluence, and a photobleaching induced absorption phenomenon was observed. We concluded that the saturation absorption level was determined by the equilibrium between two-photon excitation and one-photon reverse reaction.


Optical Microlithography XVI | 2003

Nikon F2 exposure tool development

Soichi Owa; Yukako Matsumoto; Yasuhiro Ohmura; Shigeru Sakuma; Takashi Aoki; Jin Nishikawa; Hiroyuki Nagasaka; Takeyuki Mizutani; Naomasa Shiraishi; Kazuhiro Kido; Issei Tanaka; Jun Nagatsuka

Present status of development of F2 (157nm) exposure tool in Nikon is described. Key points of F2 exposure tool are reported; low aberration projection optics, CaF2 quality, coating durability and gas purging of the pellicle space. We also report the measurement of refractive index inhomogeneity inside CaF2 crystals, which is suspected as the cause of local flare. Characteristics of high NA optics over 0.9 are investigated by imaging simulations for both 193nm and 157nm wavelengths, which are compared NA=0.85 imaging.


Archive | 2000

Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element

Shigeru Sakuma; Shuuichi Takano


Archive | 1999

Manufacturing method for calcium fluoride and calcium fluoride for photolithography

Shigeru Sakuma; Tsutomu Mizugaki; Kazuo Kimura; Shuuichi Takano


Archive | 2000

Optical member for photolithography and photolithography apparatus

Shigeru Sakuma; Masaki Shiozawa


Archive | 2003

Optical member for photolithography and method for evaluating the same

Shigeru Sakuma


Archive | 1996

Production of calcium fluoride crystal

Tsutomu Mizugaki; Hidemi Nishikawa; Shigeru Sakuma; Masaki Shiozawa; Shuichi Takano; 繁 佐久間; 正樹 塩澤; 勉 水垣; 秀美 西川; 修一 高野


Archive | 1996

Calcium fluoride crystal and production thereof

Tsutomu Mizugaki; Shigeru Sakuma; Masaki Shiozawa; 繁 佐久間; 正樹 塩澤; 勉 水垣


Archive | 1994

Fluorite for photolithography

Tsutomu Mizugaki; Hidemi Nishikawa; Shigeru Sakuma; Masaki Shiozawa; Shuichi Takano; 繁 佐久間; 正樹 塩澤; 勉 水垣; 秀美 西川; 修一 高野


Archive | 1998

Fluoride single crystal-made raw material for making optical element and production of the same raw material

Shigeru Sakuma; Shuichi Takano; 繁 佐久間; 修一 高野

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