Sunao Murakami
National Institute of Advanced Industrial Science and Technology
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Publication
Featured researches published by Sunao Murakami.
international conference on solid-state sensors, actuators and microsystems | 2011
Mitsuo Konno; Tsuyoshi Ikehara; Sunao Murakami; Ryutaro Maeda; Mutsumi Kimura; Tadashi Fukawa; Takashi Mihara
We developed a new disk resonator which has high quality factor, highly efficient mass detection ability, and area-effective layout. High quality factor was achieved by minimizing support loss using nodal-point position control on the structural design. Sensing platform in the center hole provides wide and high-sensitive mass detection area. We also developed an oscillation circuit using impedance transform circuit which is suitable to MEMS resonators with high motional impedance. Toluene gas detection was demonstrated using this oscillator.
Japanese Journal of Applied Physics | 2012
Sunao Murakami; Kenichiro Ohtaki; Sohei Matsumoto; Tomoya Inoue
High-throughput and stable treatments are required to achieve the practical production of chemicals with microreactors. However, the flow maldistribution to the paralleled microchannels has been a critical problem in achieving the productive use of multichannel microreactors for multiphase flow conditions. In this study, we newly designed and fabricated a glass four-channel catalytic packed-bed microreactor for the scale-up of gas–liquid multiphase chemical reactions. We embedded microstructures generating high pressure losses at the upstream side of each packed bed, and experimentally confirmed the efficacy of the microstructures in decreasing the maldistribution of the gas–liquid flow to the parallel microchannels.
Japanese Journal of Applied Physics | 2010
Sunao Murakami; Mitsuo Konno; Tsuyoshi Ikehara; Ryutaro Maeda; Takashi Mihara
We have newly designed and fabricated single crystal silicon (SCS) disk-type micromechanical resonators with 150-nm-wide vertical transducer gaps. The transducer gaps have been fabricated through a simple process including a single trench etching of SCS by deep reactive ion etching (D-RIE) with a resist mask patterned by electron beam lithography. The peak resonant frequencies measured for the fabricated resonators agreed well with those predicted by finite element simulations. Furthermore, the D-RIE process conditions for transducer gaps have been improved. Using the improved D-RIE process conditions, less tapered gaps of 2 µm deep were successfully fabricated for 100-, 150-, and 200-nm-wide gap patterns. The sidewall angle was from 88 to 89° depending on the gap width.
Japanese Journal of Applied Physics | 2012
Tsuyoshi Ikehara; Mitsuo Konno; Sunao Murakami; Takashi Mihara
The frequency stability of a silicon cantilever resonator against temperature was investigated under open-loop and closed-loop conditions. The authors found that the adjustment of the circuit phase in the closed-loop condition induced a significant change in temperature coefficient. The observed temperature coefficient dependence on the circuit phase was analyzed with the temperature dependence of elasticity in silicon and the phase shift originated from the oscillation circuit. The existence of a phase shift of 1.37°/°C was evaluated from the measured results. The phase effect was comparable to the elasticity effect on the temperature coefficient.
nano/micro engineered and molecular systems | 2011
Sunao Murakami; Mitsuo Konno; Tsuyoshi Ikehara; Ryutaro Maeda; Takashi Mihara
Disk microresonators employing in-plane resonant modes are promising candidates as functional elements for high-sensitive mass sensing applications because they provide a high quality factor (Q) in air at atmospheric pressure. The authors have newly designed and fabricated single crystal silicon (SCS) annular micromechanical resonators with an inner to outer radius ratio of 0.17. The beam structures to support the resonator were connected to the two nodal points expected for a specified in-plane resonant mode. The resonator was electrostatically driven and detected with 150-nm-wide vertical transducer gaps that were fabricated by trench etching of the SCS using deep reactive ion etching (D-RIE) with a resist mask patterned by electron beam lithography. The fabricated resonators show a resonant peak at 50.10 MHz with a Q of 3000 in air. The measured peak resonant frequency agreed well with the frequency predicted by finite element simulations.
Advanced Materials Research | 2011
Sunao Murakami; Tsuyoshi Ikehara; Mitsuo Konno; Ryutaro Maeda; Takashi Mihara
Additional formation of functional films on the defined micro-areas on the microstructure is often complicated and need advanced control technique. Any simple and faster deposition processes are favorable. In this paper, we propose a simple processing method to form thin films on the defined areas by falling dispersion liquid containing the coating materials on a tilted silicon substrate with trench frames. We attempted to hold the coating solution and to form a thin film within the framed micro-area. We fabricated 500 nm-wide trench frames on silicon substrates, and flew a diluted photoresist (PR) solution, as the coating solution, on the tilted surface with the frames. PR film was successfully formed on the framed area for the substrate modified with hexamethyldisilazane (HMDS). However, the area-selective PR deposition was difficult in case the substrate was not treated with HMDS. It is likely that lower contact angle for the substrate without HMDS treatment is unfavorable for the area-selective PR deposition for the excess adhesive properties of the coating solution to the surface. The effectiveness of the frames as the guide to hold a liquid droplet within the defined area was considered.
Fuel Processing Technology | 2013
Tomoya Inoue; Kenichiro Ohtaki; Sunao Murakami; Sohei Matsumoto
Chemical Engineering Journal | 2015
Tomoya Inoue; Jiro Adachi; Kenichiro Ohtaki; Ming Lu; Sunao Murakami; Xu Sun; Dong F. Wang
Catalysis Today | 2015
Tomoya Inoue; Kenichiro Ohtaki; Jiro Adachi; Ming Lu; Sunao Murakami
Micro & Nano Letters | 2011
Sunao Murakami; M. Konno; Tsuyoshi Ikehara; Ryutaro Maeda; Takashi Mihara
Collaboration
Dive into the Sunao Murakami's collaboration.
National Institute of Advanced Industrial Science and Technology
View shared research outputsNational Institute of Advanced Industrial Science and Technology
View shared research outputsNational Institute of Advanced Industrial Science and Technology
View shared research outputsNational Institute of Advanced Industrial Science and Technology
View shared research outputsNational Institute of Advanced Industrial Science and Technology
View shared research outputs