Supeng Ge

The coherent interlayer resistance of a single, rotated interface between two stacks of AB graphite

The coherent, interlayer resistance of a misoriented, rotated interface between two stacks of AB graphite is determined for a variety of misorientation angles. The quantum-resistance of the ideal AB stack is on the order of 1 to 10 mΩ μm2. For small rotation angles, the coherent interlayer resistance exponentially approaches the ideal quantum resistance at energies away from the charge neutrality point. Over a range of intermediate angles, the resistance increases exponentially with cell size for minimum size unit cells. Larger cell sizes, of similar angles, may not follow this trend. The energy dependence of the interlayer transmission is described.

Interlayer resistance of misoriented MoS2

Interlayer misorientation in transition metal dichalcogenides alters their interlayer distance, total energy, electronic band structure, and vibrational modes, but its effect on the interlayer resistance is not known. This study analyzes the interlayer resistance of misoriented bilayer MoS2 as a function of the misorientation angle, and it shows that interlayer misorientation exponentially increases the electron resistivity while leaving the hole resistivity almost unchanged. The physics, determined by the wave functions at the high symmetry points, are generic among the popular semiconducting transition metal dichalcogenides (TMDs). The asymmetrical effect of misorientation on the electron and hole transport may be exploited in the design and optimization of vertical transport devices such as a bipolar transistor. Density functional theory provides the interlayer coupling elements used for the resistivity calculations.

Graphene contacts to a HfSe2/SnS2 heterostructure

Two-dimensional (2D) heterostructures and all-2D contacts are of high interest for electronic device applications, and the SnS2/HfSe2 bilayer heterostructure with graphene contacts has some unique, advantageous properties. The SnS2/HfSe2 heterostructure is interesting because of the strong intermixing of the two conduction bands and the large work function of the SnS2. The band lineup of the well separated materials indicates a type II heterostructure, but the conduction band minimum of the SnS2/HfSe2 bilayer is a coherent superposition of the orbitals from the two layers with a spectral weight of 60% on the SnS2 and 40% on the HfSe2 for AA stacking. These relative weights can be either increased or reversed by an applied vertical field. A 3×3 supercell of graphene and a 2×2 supercell of SnS2/HfSe2 have a lattice mismatch of 0.1% and both the SnS2/HfSe2 conduction band at M and the graphene Dirac point at K are zone-folded to Γ. Placing graphene on the SnS2/HfSe2 bilayer results in large n-type charge transfer doping of the SnS2/HfSe2 bilayer, on the order of 1013/cm2, and the charge transfer is accompanied by a negative Schottky barrier contact for electron injection from the graphene into the SnS2/HfSe2 bilayer conduction band. Binding energies and the anti-crossing gaps of the graphene and the SnS2/HfSe2 electronic bands both show that the coupling of graphene to the HfSe2 layer is significantly larger than its coupling to the SnS2 layer. A tunneling Hamiltonian estimate of the contact resistance of the graphene to the SnS2/HfSe2 heterostructure predicts an excellent low-resistance contact.