T. Kawamoto

Optimization of Cs deposition in the 1/3 scale hydrogen negative ion source for the large helical device-neutral beam injection system

A compact cesium deposition system was used for direct deposition of cesium atoms and ions onto the inner surface of the 1/3 scale hydrogen negative ion source for the large helical device-neutral beam injection (LHD-NBI), system. A small, well defined amount of cesium deposition in the range of 3–200 mg was tested. Negative ion extraction and acceleration were carried out both in the pure hydrogen operation mode and in the cesium mode. Single Cs deposition of 3–30 mg to the plasma chamber has produced temporary 2–5 times increases of H− yield, but the yield was decreased within several discharge pulses to the previous steady-state value. Two consecutive 30 mg depositions done within a 3–5 h/60 shot interval, produced a similar temporary increase of H− beam, but reached a large H− yield steady-state value. Deposition of larger 0.1–0.2 g Cs portions with a 20–120 h/150–270 shot interval improved the H− yield for a long (2–5 days) period of operation. Directed depositions of Cs to the various walls of the p...

Recovery of cesium in the hydrogen negative ion sources

Cesium recovery from the polluted layers in the 1/3 scale hydrogen negative ion source for LHD-NBI system has tested. It was found that the cesium recovery can be produced by additional discharges as from the cesium layer, aged by tungsten and residual gas, so as from the cesium layers, polluted by an occasional water leak. The highest cesium recovery to negative ion production was produced by a xenon arc, while glow discharge and arcing in hydrogen were less effective. The mechanism of recovery is the ejection of cesium from the underlying enriched layer by the arc and its transport to the surface.

Negative ion source improvement by introduction of a shutter mask

Studies of a multicusp source were recently done at the National Institute for Fusion Science by plasma grid masking. The maximal H− ion yield is ∼1.4 times greater for the shutter mask case than that for the standard source. Negative ion current evolution during the cesium feed to the masked plasma grid evidenced that about 60% of negative ions are produced on the shutter mask surface, while about 30% are formed on the plasma grid emission hole edges, exposed by cesium with the mask open.

Cesiated hollow cathodes in the multicusp ion source

A cesiated hydrogen hollow cathode (CHC) was tested for plasma injection in the multicusp negative ion source (MS). The CHC arc with hydrogen feed and cesium seeding through the CHC volume was explored. One cathode unit (40 mm length, 19 mm in diameter, emission opening area 1–3 mm2) with no special cooling provided the MS discharge operation with direct current up to 30 A, and up to 60 A in the long-pulse mode. High efficiency of negative ion production in the MS discharge, driven by a CHC plasma injection was recorded.

Plasma Injection From Several Cesiated Hollow Cathodes into Large H− Ion Sources

Compact cesiated hollow cathodes (CHC) has been developed and studied in two large multicusp H− ion sources at NIFS, aiming the long lifetime cathodes for plasma production in the neutral beam injectors. Results on hollow cathodes and power supplies improvement are described. Basic characteristics of multicusp source discharge, driven by several CHCs were studied. Key issues about simultaneous CHCs operation in high current discharge mode are discussed. Each of advanced CHC delivered stable and quiet income with current up to 70A for 5sec to multicusp source discharge. The hollow cathode operation with no Cs feed was obtained by using 30%Xe+70%H2 gas mixture.