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Tanaka Tsutomu

Applied Materials

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Publication

Featured researches published by Tanaka Tsutomu.

Archive | 1998

DEVICE AND METHOD FOR IMPROVING SUBSTRATE PROCESSING SYSTEM BY MICROWAVE PLASMA SOURCE

Tanaka Tsutomu; Mukul Kelkar; Fairbairn Kevin; Ponnekanti Hari; Cheung David

Archive | 2002

METHOD AND SYSTEM FOR ENHANCING UTILIZATION EFFICIENCY OF GAS UNDER PROCESSING SEMICONDUCTOR

Raoux Sebastien; Tanaka Tsutomu; Nowak Thomas

Archive | 1999

METHOD AND DEVICE FOR OBTAINING FINAL POINT IN PLASMA CLEANING PROCESS

Sudohakaa Suburamanyan; Tanaka Tsutomu; Mukul Kelkar

Archive | 1998

REMOTE PLASMA DEVICE

Fairbairn Kevin; Ponnekanti Hari; Cheung David W; Tanaka Tsutomu; Kelkar Mukul

Archive | 1998

Method and apparatus for substrate processing

David Cheung; Kevin Fairbairn; Kelkar Mukul; Hari Ponnekanti; Tanaka Tsutomu

Archive | 1998

MICROWAVE DEVICE FOR IN-SITU CLEANING FOR VACUUM PIPE OF SUBSTRATE PROCESSOR

Raoux Sebastian; Kelker Mukul; Ponnekanti Hari; Fairbairn Kevin; Cheung David; Tanaka Tsutomu

Archive | 2003

Method and apparatus for increasing the utilization efficiency of gases during semiconductor processing

Raoux Sebastien; Tanaka Tsutomu; Nowak Thomas

Archive | 2002

EXTERNAL IONIZATION-ASSISTED CVD SYSTEM

Tanaka Tsutomu; Nowak Thomas; Fairbairn Kevin

Archive | 2009

Resonanzstruktur mit räumlich getrennten plasma-seerators und schaltelementen

Hanawa Hiroji; Ramaswamy Katik; Collins Kenneth S; Nguyen Andrew; Monroy Gonzalo Antonio; Tanaka Tsutomu; Ye Yan

Archive | 2008

Wärmeschutzvorrichtung für Dichtungsringe in einem Plasmaerzeugungsgerät

Tanaka Tsutomu; Nowak Thomas; Nguyen Chau; Ponnekanti Hari; Fairbairn Kevin

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Fairbairn Kevin

Applied Materials

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Nowak Thomas

Applied Materials

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Ponnekanti Hari

Applied Materials

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Cheung David

Applied Materials

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Kelkar Mukul

Applied Materials

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Collins Kenneth S

Applied Materials

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David Cheung

Applied Materials

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Hanawa Hiroji

Applied Materials

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Hari Ponnekanti

Applied Materials

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Kevin Fairbairn

Applied Materials

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