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Dive into the research topics where Teruhiko Kumada is active.

Publication


Featured researches published by Teruhiko Kumada.


international microprocesses and nanotechnology conference | 2005

Newly developed RELACS process and materials for 65nm node device and beyond

M. Terai; Teruhiko Kumada; T. Ishibashi; Tetsuro Hanawa

To meet markets demands for high performance devices, we have studied various resolution enhancement techniques (RET), such as off axis illumination, phase shift masks, optical proximity correction, resist thermal reflow, and chemical shrinkage process etc. RELACS (resolution enhancement lithography assisted by chemical shrink) is one of the most useful technology among chemical shrink processes. We have introduced KrF-RELACS process into mass production phase. However, in the case of ArF lithography, we are not able to be satisfied with shrinkage performance of conventional RELACS materials. To improve this matter, we paid attention to the chemically difference of side chain between KrF resist and ArF resist polymers.


Archive | 2002

Low dielectric constant material, process for preparing the same, insulating film comprising the same and semiconductor device

Hideharu Nobutoki; Teruhiko Kumada; Toshiyuki Toyoshima; Naoki Yasuda; Suguru Nagae


Archive | 1990

Radiation-sensitive polymer and radiation-sensitive composition containing the same

Youko Tanaka; Shigeru Kubota; Hideo Horibe; Hiroshi Koezuka; Teruhiko Kumada


Archive | 2002

Low dielectric constant material, insulating film comprising the low dielectric constant material, and semiconductor device

Hideharu Nobutoki; Teruhiko Kumada; Toshiyuki Toyoshima; Naoki Yasuda; Suguru Nagae


Archive | 2002

Mask blank, protective film therefor and method of patterning mask blank

Teruhiko Kumada; Atsuko Fujino; Kazuyuki Maetoko


Archive | 2003

Via-filling material and process for fabricating semiconductor integrated circuit using the material

Teruhiko Kumada; Toshiyuki Toyoshima; Hideharu Nobutoki; Takeo Ishibashi; Yoshiharu Ono; Junjiro Sakai


Archive | 2001

Developing process, process for forming pattern and process for preparing semiconductor device using same

Atsuko Fujino; Teruhiko Kumada; Atsushi Oshida; Koji Tange; Hitoshi Fukuma


Archive | 1997

Resist coating film

Teruhiko Kumada; Atsuko Sasahara; Youko Tanaka; Hideo Horibe; Shigeru Kubota; Hiroshi Koezuka; Tetsuro Hanawa


Archive | 2005

Process for preparing low dielectric constant material

Hideharu Nobutoki; Teruhiko Kumada; Toshiyuki Toyoshima; Naoki Yasuda; Suguru Nagae


Archive | 2001

Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure

Toyoki Kitayama; Kenji Itoga; Kenji Marumoto; Atsuko Fujino; Teruhiko Kumada

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