Tetsuya Takei

Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same

Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof

Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method

Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method

Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process

Electrophotographic light-receiving member

Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space

MICROWAVE PCVD METHOD FOR CONTINUOUSLY FORMING A LARGE AREA FUNCTIONAL DEPOSITED FILM USING A CURVED MOVING SUBSTRATE WEB WITH MICROWAVE ENERGY WITH A DIRECTIVITY IN ONE DIRECTION PERPENDICULAR TO THE DIRECTION OF MICROWAVE PROPAGATION

Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition

Process and apparatus for microwave plasma chemical vapor deposition