Tohru Koyama

Apparatus for analyzing a failure in a semiconductor wafer and method thereof

Scanning photoinduced current analyzer capable of detecting photoinduced current in nonbiased specimen

Semiconductor device having a two layered structure gate electrode

Method of analyzing failure of semiconductor device by using emission microscope and system for analyzing failure of semiconductor device

System for analyzing a failure in a semiconductor wafer by calculating correlation coefficient between collated data of defects per prescribed unit and failures per prescribed unit

Semiconductor device having a gate electrode of polycrystal layer and a method of manufacturing thereof

System LSI chip having a logic part and a memory part

HALBLEITEREINRICHTUNG UND VERFAHREN ZU DEREN HERSTELLUNG

Method of manufacturing semiconductor device having a two layered structure gate electrode

Semiconductor device for use in MOS transistor mfr. - comprising polycrystalline silicon gate electrode with defined crystal orientation, semiconductor substrate and pair of impurity regions