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Tomohiko Abe

Fujitsu

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Publication

Featured researches published by Tomohiko Abe.

Archive | 1996

Charged particle beam exposure system and method

Yoshihisa Oae; Tomohiko Abe; Soichiro Arai; Hiroshi Yasuda; Kenichi Miyazawa; Junichi Kai; Takamasa Satoh; Keiichi Betsui; Hideki Nasuno

Archive | 1999

Charged particle beam exposure system

Yoshihisa Oae; Tomohiko Abe; Soichiro Arai; Hiroshi Yasuda; Kenichi Miyazawa; Junichi Kai; Takamasa Satoh; Keiichi Betsui; Hideki Nasuno

Archive | 1996

Method of and system for charged particle beam exposure

Takamasa Satoh; Hiroshi Yasuda; Junichi Kai; Yoshihisa Oae; Hisayasu Nishino; Kiichi Sakamoto; Hidefumi Yabara; Isamu Seto; Masami Takigawa; Akio Yamada; Soichiro Arai; Tomohiko Abe; Takashi Kiuchi; Kenichi Miyazawa

Archive | 1996

Method of and system for exposing pattern on object by charged particle beam

Takamasa Satoh; Yoshihisa Oae; Soichiro Arai; Kenichi Miyazawa; Hiroshi Yasuda; Manabu Ohno; Hitoshi Watanabe; Junichi Kai; Tomohiko Abe; Akio Yamada; Yasushi Takahashi

Archive | 1993

Charged particle beam exposure system and method of exposing a pattern on an object by such a charged particle beam exposure system

Akio Yamada; Yoshihisa Oae; Satoru Yamazaki; Tomohiko Abe; Katsuhiko Kobayashi; Kiichi Sakamoto; Junko Hatta

Archive | 1994

Blanking aperture array type charged particle beam exposure

Hiroshi Yasuda; Yasushi Takahashi; Yoshihisa Oae; Tomohiko Abe; Shunsuke Fueki

Archive | 1999

Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements

Yoshihisa Oae; Tomohiko Abe; Soichiro Arai; Hiroshi Yasuda; Kenichi Miyazawa; Junichi Kai; Takamasa Satoh; Keiichi Betsui; Hideki Nasuno

Archive | 1992

Lithography system using charged-particle beam and method of using the same

Akio Yamada; Yoshihisa Oae; Satoru Yamazaki; Tomohiko Abe

Archive | 1993

Electron beam exposure apparatus employing blanking aperture array

Hiroshi Yasuda; Yoshihisa Oae; Tomohiko Abe

Archive | 1996

Charged particle exposure apparatus, and a charged particle exposure method

Yoshihisa Ooaeh; Tomohiko Abe; Hiroshi Yasuda

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Collaboration

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Hiroshi Yasuda

Fujitsu

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Yoshihisa Oae

Fujitsu

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Junichi Kai

Fujitsu

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Kenichi Miyazawa

Fujitsu

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Soichiro Arai

Fujitsu

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Takamasa Satoh

Fujitsu

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Akio Yamada

Fujitsu

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Kiichi Sakamoto

Fujitsu

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Hideki Nasuno

Fujitsu

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Keiichi Betsui

Fujitsu

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