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Dive into the research topics where Tomosuke Yoshida is active.

Publication


Featured researches published by Tomosuke Yoshida.


Japanese Journal of Applied Physics | 1996

Transmission Electron Microscope Observation of “IR Scattering Defects” in As-Grown Czochralski Si Crystals

Masahiro Kato; Tomosuke Yoshida; Yasuhiro Ikeda; Yutaka Kitagawara

Grown-in defects detected by IR laser scattering tomography (LSTDs) in Czochralski-grown Si crystals were identified for the first time by transmission electron microscopy (TEM) with a special defect positioning technique. The basic structure of each LSTD was revealed to be a composite of two or three incomplete octahedral voids with a total size of 100–300 nm. The TEM images of the defects suggest the existence of walls several nanometers thick surrounding the voids. A weak oxygen signal was detected from the defect by energy dispersive X-ray spectrometry. The thin walls surrounding the voids were considered to be made of SiOx .


Archive | 1999

Method for producing an epitaxial silicon single crystal wafer and the epitaxial silicon single crystal wafer

Masaro Tamatsuka; Ken Aihara; Tomosuke Yoshida


Archive | 2005

Method of manufacturing silicon epitaxial wafer

Fumitaka Kume; Tomosuke Yoshida; Ken Aihara; Ryoji Hoshi; Satoshi Tobe; Naohisa Toda; Fumio Tahara


Archive | 2005

Silicon Epitaxial Wafer and Manufacturing Method Thereof

Fumitaka Kume; Tomosuke Yoshida; Ken Aihara; Ryoji Hoshi; Satoshi Tobe; Naohisa Toda; Fumio Tahara


Archive | 2002

Susceptor, vapor phase growth apparatus, epitaxial wafer manufacturing apparatus, epitaxial wafer manufacturing method, and epitaxial wafer

Tomosuke Yoshida; Takeshi Arai; Kenji Akiyama; Hiroki Ose


Archive | 1997

Method for evaluating oxygen concentrating in semiconductor silicon single crystal

Tomosuke Yoshida; Yutaka Kitagawara


Archive | 2004

Silicon epitaxial wafer, and silicon epitaxial wafer manufacturing method

Tomosuke Yoshida; Hitoshi Tsunoda; Masahiro Kato


Archive | 2010

METHOD FOR MANUFACTURING SILICON EPITAXIAL WAFER

Tomosuke Yoshida


Archive | 2005

Silicon epitaxial wafer and process for producing the same

Fumitaka Kume; Tomosuke Yoshida; Ken Aihara; Ryoji Hoshi; Satoshi Tobe; Naohisa Toda; Fumio Tahara


Archive | 2006

Method for Manufacturing Epitaxial Wafer and Epitaxial Wafer Manufactured by this Method

Tomosuke Yoshida; Naohisa Toda

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Ken Aihara

East Tennessee State University

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Naohisa Toda

East Tennessee State University

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Masaro Tamatsuka

East Tennessee State University

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Yutaka Kitagawara

East Tennessee State University

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Fumio Tahara

East Tennessee State University

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Fumitaka Kume

East Tennessee State University

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Ryoji Hoshi

East Tennessee State University

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Satoshi Tobe

East Tennessee State University

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Hitoshi Tsunoda

East Tennessee State University

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Masahiro Kato

Mitsubishi Heavy Industries

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