Torben R. Fortune

An AlN/Al0.85Ga0.15N high electron mobility transistor

An AlN barrier high electron mobility transistor (HEMT) based on the AlN/Al0.85Ga0.15N heterostructure was grown, fabricated, and electrically characterized, thereby extending the range of Al composition and bandgap for AlGaN channel HEMTs. An etch and regrowth procedure was implemented for source and drain contact formation. A breakdown voltage of 810 V was achieved without a gate insulator or field plate. Excellent gate leakage characteristics enabled a high Ion/Ioff current ratio greater than 107 and an excellent subthreshold slope of 75 mV/decade. A large Schottky barrier height of 1.74 eV contributed to these results. The room temperature voltage-dependent 3-terminal off-state drain current was adequately modeled with Frenkel-Poole emission.

Comparison of nBn and nBp mid-wave barrier infrared photodetectors

We have fabricated mid-wave infrared photodetectors containing InAsSb absorber regions and AlAsSb barriers in n-barrier-n (nBn) and n-barrier-p (nBp) configurations, and characterized them by current-voltage, photocurrent, and capacitance-voltage measurements in the 100-200 K temperature range. Efficient collection of photocurrent in the nBn structure requires application of a small reverse bias resulting in a minimum dark current, while the nBp devices have high responsivity at zero bias. When biasing both types of devices for equal dark currents, the nBn structure exhibits a differential resistance significantly higher than the nBp, although the nBp device may be biased for arbitrarily low dark current at the expense of much lower dynamic resistance. Capacitance-voltage measurements allow determination of the electron concentration in the unintentionally-doped absorber material, and demonstrate the existence of an electron accumulation layer at the absorber/barrier interface in the nBn device. Numerical simulations of idealized nBn devices demonstrate that photocurrent collection is possible under conditions of minimal absorber region depletion, thereby strongly suppressing depletion region Shockley-Read-Hall generation.

Mesa-isolated InGaAs photodetectors with low dark current

We demonstrate InGaAs photodiodes with an epitaxial heterostructure that allows simple mesa isolation of individual devices with low dark current and high responsivity. An undoped InAlAs barrier and passivation layer enables isolation of detectors without exposing the InGaAs active region, while simultaneously reducing electron diffusion current. Photodetectors with mesa sizes as small as 25×25 μm2 exhibit dark current densities of 10 nA/cm2 at 295 K and responsivities of 0.62 A/W at 1550 nm.

Minority carrier lifetime and dark current measurements in mid-wavelength infrared InAs0.91Sb0.09 alloy nBn photodetectors

Carrier lifetime and dark current measurements are reported for a mid-wavelength infrared InAs0.91Sb0.09 alloy nBn photodetector. Minority carrier lifetimes are measured using a non-contact time-resolved microwave technique on unprocessed portions of the nBn wafer and the Auger recombination Bloch function parameter is determined to be |F1F2|=0.292. The measured lifetimes are also used to calculate the expected diffusion dark current of the nBn devices and are compared with the experimental dark current measured in processed photodetector pixels from the same wafer. Excellent agreement is found between the two, highlighting the important relationship between lifetimes and diffusion currents in nBn photodetectors.

Optical and electrical properties of narrow-bandgap infrared W-structure superlattices incorporating AlAs/AlSb/AlAs barrier layers

Optical and electrical properties of nBn photodetectors using InAs/AlAs/AlSb/AlAs/InAs/InAs0.61Sb0.39W-structure superlattice (W-SL) absorbers are reported. Minority carrier lifetimes of 500 ± 50 ns and 400 ± 30 ns, and Auger coefficients of 2.1 × 10−26 cm6/s and 1.6 × 10−25 cm6/s, for samples with bandgap energies of 5.3 μm (W-SL A) and 7.5 μm (W-SL B) are reported at 100 K, respectively. Shockley–Read–Hall defect states are identified at 65 meV and 45 meV above the W-SL valence band edges for W-SLs A and B, respectively. Dark currents are also reported and compared with diffusion currents calculated using the carrier lifetime data, suggesting low vertical heavy hole diffusivity.

GaSb-based infrared detectors utilizing InAsPSb absorbers

InPSb and InAsPSb have been investigated for use as absorber materials in GaSb-based n-type/barrier/n-type (nBn) detectors with cutoff wavelengths shorter than 4.2 μm. The growth temperature window for high-quality InPSb lattice-matched to GaSb by molecular beam epitaxy is approximately 440–460 °C. InPSb films with thicknesses greater than approximately 1 μm or films grown outside this temperature window have high densities of large defects, with films grown at lower temperatures exhibiting evidence of significant phase separation. In contrast, InAsPSb films can be grown with excellent surface morphologies and no apparent phase separation over a wide temperature range. InAsPSb samples with low-temperature photoluminescence between 3.0 and 3.4 μm and lattice mismatch of less than 1 × 10−3 have been grown, although both photoluminescence and x-ray diffraction data exhibit peak splitting indicative of compositional nonuniformity. AlAsSb-barrier nBn detectors with InPSb and InAsPSb absorbers have been fabrica...

Enhanced infrared detectors using resonant structures combined with thin type-II superlattice absorbers

We examined the spectral responsivity of a 1.77 μm thick type-II superlattice based long-wave infrared detector in combination with metallic nanoantennas. Coupling between the Fabry-Perot cavity formed by the semiconductor layer and the resonant nanoantennas on its surface enables spectral selectivity, while also increasing peak quantum efficiency to over 50%. Electromagnetic simulations reveal that this high responsivity is a direct result of field-enhancement in the absorber layer, enabling significant absorption in spite of the absorbers subwavelength thickness. Notably, thinning of the absorbing material could ultimately yield lower photodetector noise through a reduction in dark current while improving photocarrier collection efficiency. The temperature- and incident-angle-independent spectral response observed in these devices allows for operation over a wide range of temperatures and optical systems. This detector paradigm demonstrates potential benefits to device performance with applications thr...

Effects of electron doping level on minority carrier lifetimes in n-type mid-wave infrared InAs/InAs1−xSbx type-II superlattices

The minority carrier lifetime (τMC) and equilibrium electron concentration (i.e., the doping level, n0) are both important values that directly determine diffusion current in infrared photodetectors utilizing n-type absorbing regions. Here, time-resolved microwave reflectance measurements are used to non-destructively measure both of these values in mid-wave infrared InAs/ InAs1−xSbx type-II superlattices with varying n-type doping levels between 2×1014 cm−3 and 2×1016 cm−3. The measured data are analyzed using carrier recombination theory to determine the doping level ranges where Shockley-Read-Hall (SRH), radiative, and Auger recombination limit τMC. The optimal doping level, which minimizes dark current, is experimentally determined and corresponds to the electron density at which τMC switches from SRH limited to Auger limited behavior. A comparison of two InAs/ InAs1−xSbx photodetectors of different equilibrium electron densities demonstrates a decrease in dark current for a doping level near the opti...

Contactless measurement of equilibrium electron concentrations in n-type InAs/InAs1−xSbx type-II superlattices

Measurements of the equilibrium majority carrier electron concentration (n0) in narrow-bandgap n-type InAs/InAs1−xSbx type-II superlattices are made using contactless time-resolved microwave reflectance (TMR). By calibrating TMR decays to the number of optically injected electron-hole pairs, direct conversion to carrier lifetimes as a function of excited carrier density is made and allowing for accurate measurement of n0. The temperature dependence of both n0 and the intrinsic carrier density (ni) are measured using this method, where n0 = 1 × 1015 cm−3 and ni = 1.74 × 1011 cm−3 at 100 K. These results provide non-destructive insight into critical parameters that directly determine infrared photodetector dark diffusion current.

Next-generation infrared focal plane arrays for high-responsivity low-noise applications

High-quality infrared focal plane arrays (FPAs) are used in many satellite, astronomical, and terrestrial applications. These applications require highly-sensitive, low-noise FPAs, and therefore do not benefit from advances made in low-cost thermal imagers where reducing cost and enabling high-temperature operation drive device development. Infrared detectors used in FPAs have been made for decades from alloys of mercury cadmium telluride (MCT). These infrared detectors are nearing the believed limit of their performance. This limit, known in the infrared detector community as Rule 07, dictates the dark current floor for MCT detectors, in their traditional architecture, for a given temperature and cutoff wavelength. To overcome the bounds imposed by Rule 07, many groups are working on detector compounds other than MCT. We focus on detectors employing III-V-based gallium-free In As Sb superlattice active regions while also changing the basic architecture of the pixel to improve signal-to-noise. Our architecture relies on a resonant, metallic, subwavelength nanoantenna patterned on the absorber surface, in combination with a Fabry-Perot cavity, to couple the incoming radiation into tightly confined modes near the nanoantenna. This confinement of the incident energy in a thin layer allows us to greatly reduce the volume of the absorbing layer to a fraction of the free-space wavelength, yielding a corresponding reduction in dark current from spontaneously generated electron-hole pairs in the absorber material. This architecture is detector material agnostic and could be applied to MCT detector structures as well, although we focus on using superlattice antimonide-based detector materials. This detector concept has been applied to both mid-wave (3–5 μm) and longwave (8–12 μm) infrared detectors and absorbers. Here we examine long-wave devices, as these detectors currently have a larger gap between desired device performance and that of currently existing detectors. The measured structures show an external quantum efficiency exceeding 50%. We present a comparison of the modeled and measured photoresponse of these detectors and compare these detectors to currently available commercial detectors using relevant metrics such as external quantum efficiency. We also discuss modeling of crosstalk between adjacent pixels and its influence on the potential for a dual-wavelength detector. Finally, we evaluate potential advances in these detectors that may occur in the near future.