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Japanese Journal of Applied Physics | 1991

Ion Energy Distribution of 13.56 MHz rf Glow Discharge in a Planar System Cathode

Toru Otsubo; Kazuhiro Ohara

The ion energy distribution of 13.56 MHz rf glow discharges in a cathode has been measured by an ion energy analyzer (IEA). In the cathode, it is necessary to decrease the measurement variation with the rf voltage. The measurement variation could be decreased by increasing the distance between the cathode electrode and the IEA to calculate the motion of ions in the rf electric field. The relationship between the ion energy distribution and the applied rf excitation voltage on the cathode has been investigated in this system. The average ion energy depends on the selfbiased dc voltage. The maximum ion energy depends on the value added to one-half of the peak-to-peak rf excitation voltage and the self-biased dc voltage.


Archive | 1990

Processing apparatus and method for plasma processing

Mitsuo Tokuda; Junzou Azuma; Toru Otsubo; Yasuhiro Yamaguchi; Ichirou Sasaki


Archive | 1997

Plasma processing apparatus and processing method

Mitsuko Imatake; Ichiro Sasaki; Toru Otsubo; Hitoshi Tamura; Takashi Kamimura


Archive | 1991

Insulating film forming method for semiconductor device interconnection

Toru Otsubo; Yasuhiro Yamaguchi


Archive | 1998

Plasma processing system and plasma processing method

Toshio Masuda; Katsuhiko Mitani; Tetsunori Kaji; Jyunichi Tanaka; Katsuya Watanabe; Shigeru Shirayone; Toru Otsubo; Ichiro Sasaki; Hideshi Fukumoto; Makoto Koizumi


Archive | 1984

Etching method and apparatus

Toru Otsubo; Susumu Aiuchi; Takashi Kamimura


Archive | 1994

Method of and apparatus for removing foreign particles

Toru Otsubo; Yasumichi Suzuki; Shinji Sasaki; Kazuhiro Ohara; Ichirou Sasaki


Archive | 1984

Plasma processing method and apparatus for carrying out the same

Toru Otsubo; Susumu Aiuchi; Takashi Kamimura; Minoru Noguchi; Teru Fujii


Archive | 1986

Method of controlling dry etching by applying an AC voltage to the workpiece

Toru Otsubo


Archive | 1991

Plasma processing apparatus using plasma produced by microwaves

Kazuhiro Ohara; Toru Otsubo; Ichirou Sasaki

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