Toru Seita

Photodegradation of Poly(vinyl propional) Film, and Improvement of Photodegradative-Durability by Chemical Reduction of the Polymer.

ポリビニルプロピオナールからなるフィルムに波長365nmの紫外光を照射し, フィルムの光劣化挙動について検討した. 各種スペクトルによる構造解析の結果から, フィルムの光劣化はポリビニルアルコールの劣化と同様の光酸化劣化反応によるものであると推定した. この推定メカニズムに基づき, 樹脂中に微量に存在する主鎖カルボニル構造および共役エノン構造を, 樹脂の還元処理によって化学的に除去した結果, 樹脂の光劣化性を大幅に改善できることを見いだした.

High Resolution Positive E-Beam Resist With Dry Etch Durability

Electron beam exposure characteristics,such as sensitivity and contrast,and durability against oxygen plasma were measured with poly(1-pheny1-2.2.2-trifluoroethyl-α-chloro-acrylate) PCLTF prepared by solution free radical polymerization. New developers were examined for this type of polymer. Using mixtures of diisobutyl ketone DIBK and isopropyl alcohol IPA (35:65),PCLTF was preciously imaged at 25pc/cm2(0.5μm lines and spaces). Moreover with use of suitable mixture of diisopropyl ketone DIPK and isopropyl alcohol (35:65),the image at 8pc/cm2(1μm lines & spaces) is also possible. PCLTF was 1.5 times the high dry etching durability of PMMA against oxygen plasma,and showed considerably high contrast and fine gaps as narrow as 0.2μm.