Yoshitaka Tsutsumi
Tosoh
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Publication
Featured researches published by Yoshitaka Tsutsumi.
Advances in Resist Technology and Processing IV | 1987
Akira Akimoto; Toru Seita; Yoshitaka Tsutsumi
Electron beam exposure characteristics,such as sensitivity and contrast,and durability against oxygen plasma were measured with poly(1-pheny1-2.2.2-trifluoroethyl-α-chloro-acrylate) PCLTF prepared by solution free radical polymerization. New developers were examined for this type of polymer. Using mixtures of diisobutyl ketone DIBK and isopropyl alcohol IPA (35:65),PCLTF was preciously imaged at 25pc/cm2(0.5μm lines and spaces). Moreover with use of suitable mixture of diisopropyl ketone DIPK and isopropyl alcohol (35:65),the image at 8pc/cm2(1μm lines & spaces) is also possible. PCLTF was 1.5 times the high dry etching durability of PMMA against oxygen plasma,and showed considerably high contrast and fine gaps as narrow as 0.2μm.
Archive | 1995
Kosaburo Matsumura; Mitsumasa Akashi; Yoshitaka Tsutsumi; Masazumi Hasegawa
Archive | 1986
Yoshitaka Tsutsumi; Toru Seita; Hideo Shuyama; Kousaburou Matsumura; Kyoko Nakazawa
Archive | 1996
Shinji Ozoe; Yoshitaka Tsutsumi; Hisamasa Wakayama; 義高 堤; 真治 尾添; 久昌 若山
Archive | 1990
Yoshitaka Tsutsumi; Teruhisa Uemura; Masazumi Hasegawa
Archive | 1988
Yoshitaka Tsutsumi; Toru Seita; Kousaburou Matsumura; Kyoko Nagaoka; Toshimitsu Yanagihara
Archive | 1993
Masazumi Hasegawa; Hiroyuki Miyamura; Tetsuo Tanaka; Yoshitaka Tsutsumi; 義高 堤; 裕之 宮村; 哲夫 田中; 正積 長谷川
Archive | 1987
Yoshitaka Tsutsumi; Toru Seita; Hideo Shuyama; Kousaburou Matsumura; Kyoko Nakazawa
Archive | 1998
Yoshitaka Tsutsumi; Yoshiharu Yamagata; 義高 堤; 義春 山縣
Archive | 1993
Masazumi Hasegawa; Teruhisa Kamimura; Yoshitaka Tsutsumi; 輝久 上村; 義高 堤; 正積 長谷川
