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Toshimitsu Ohmine

Toshiba

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Publication

Featured researches published by Toshimitsu Ohmine.

Archive | 1990

VAPOR DEPOSITION SYSTEM

Toshimitsu Ohmine; Keiichi Akagawa

Archive | 1994

Vapor-phase deposition apparatus and vapor-phase deposition method

Yuusuke Sato; Toshimitsu Ohmine

Archive | 1988

Exhaust processing apparatus

Toshimitsu Ohmine; Takaaki Honda; Keiiti Akagawa

Archive | 1999

AMMONIUM HALIDE ELIMINATOR, CHEMICAL VAPOR DEPOSITION SYSTEM AND CHEMICAL VAPOR DEPOSITION PROCESS

Yuusuke Sato; Takashi Kataoka; Naoki Tamaoki; Toshimitsu Ohmine

Archive | 1997

Thermal processing apparatus with a shield between heater and substrate

Toshimitsu Ohmine; Martin Schrems

Archive | 1991

Gas-phase growing method and apparatus for the method

Toshimitsu Ohmine

The Japan Society of Applied Physics | 1992

Silicon Epitaxial Growth by a Fast Wafer Rotating Reactor Using Silane Gas

Yuusuke Sato; Tamami Tamura; Toshimitsu Ohmine

Archive | 1991

Gas-phase growing method for the method

Toshimitsu Ohmine

Archive | 2000

SiH4 Reaction Mechanism Research Using A Fast Wafer-Rotating Reactor

Yuusuke Sato; Naoki Tamaoki; Toshimitsu Ohmine; Toshiba Corp; Komukai Toshiba-cho

The Japan Society of Applied Physics | 1993

The Surface Reaction Rate for Silane on Polycrystalline Silicon Obtained by Using a Fast Wafer-Rotating Reactor

Yuusuke Sato; Naoki Tamaoki; Toshimitsu Ohmine

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Yuusuke Sato

Toshiba

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Naoki Tamaoki

Toshiba

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Keiichi Akagawa

Toshiba

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Keiiti Akagawa

Toshiba

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Martin Schrems

Toshiba

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Takaaki Honda

Toshiba

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