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Tsutomu Ogiwara

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Publication

Featured researches published by Tsutomu Ogiwara.

Archive | 2007

ANTIREFLECTION FILM MATERIAL, SUBSTRATE HAVING ANTIREFLECTION FILM, AND PATTERN FORMING METHOD

Jun Hatakeyama; Motoaki Iwabuchi; Tsutomu Ogiwara; Takashi Ueda; 貴史 上田; 元亮 岩淵; 畠山 潤; 勤 荻原

Archive | 2007

Composition for forming metal oxide-containing film, metal oxide-containing film, substrate having metal oxide-containing film formed thereon, and pattern formation method using the same

Mutsuo Nakajima; Tsutomu Ogiwara; Takashi Ueda; Toshiharu Yano; 貴史 上田; 睦雄 中島; 俊治 矢野; 勤 荻原

Archive | 2007

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method using the same substrate

Motoaki Iwabuchi; Tsutomu Ogiwara; Takashi Ueda; 貴史 上田; 元亮 岩淵; 勤 荻原

Archive | 2007

Composition for forming silicon-containing film, silicon-containing film, substrate with silicon-containing film formed thereon, and pattern forming method using the same

Takeshi Asano; Motoaki Iwabuchi; Tsutomu Ogiwara; Takashi Ueda; 貴史 上田; 元亮 岩淵; 健 浅野; 勤 荻原

Archive | 2007

Antireflection film material, substrate and patterning process

Takeshi Asano; Motoaki Iwabuchi; Tsutomu Ogiwara; Takashi Ueda; 貴史 上田; 元亮 岩淵; 健 浅野; 勤 荻原

Archive | 2010

Composition for forming resist underlayer film, method for forming resist underlayer film, and patterning method

Toshihiko Fujii; Go Kanao; Daisuke Koori; Tsutomu Ogiwara; Katsuya Takemura; Takeshi Watanabe; 武 渡辺; 勝也 竹村; 勤 荻原; 俊彦 藤井; 大佑 郡; 剛 金生

Archive | 2007

PHOTORESIST UNDERLAY FILM MATERIAL, PHOTORESIST UNDERLAY FILM SUBSTRATE, AND PATTERN FORMING METHOD

Jun Hatakeyama; Mutsuo Nakajima; Tsutomu Ogiwara; 睦雄 中島; 畠山 潤; 勤 荻原

Archive | 2009

Method for forming resist underlayer film and patterning process using the same

Toshihiko Fujii; Jun Hatakeyama; Tsutomu Ogiwara; 畠山 潤; 勤 荻原; 俊彦 藤井

Archive | 2009

Method of forming resist underlay film and method of forming pattern using the same

Toshihiko Fujii; Jun Hatakeyama; Tsutomu Ogiwara; 畠山 潤; 勤 荻原; 俊彦 藤井

Archive | 2011

Composition for forming resist underlay film containing silicon, and pattern forming method

Tsutomu Ogiwara; 勤 荻原; Takashi Ueda; 貴史 上田; Toshiharu Yano; 俊治 矢野; Yoshinori Taneda; 義則 種田

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Collaboration

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Seiichiro Tachibana

Shin-Etsu Chemical

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Yoshinori Taneda

Shin-Etsu Chemical

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Motoaki Iwabuchi

East Tennessee State University

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Jun Hatakeyama

Shin-Etsu Chemical

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Toshihiko Fujii

Shin-Etsu Chemical

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Toshiharu Yano

Shin-Etsu Chemical

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Katsuya Takemura

Panasonic

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Hiroyuki Urano

Shin-Etsu Chemical

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Kazumi Noda

Shin-Etsu Chemical

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Koji Hasegawa

Shin-Etsu Chemical

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