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Hiroyuki Urano

Shin-Etsu Chemical

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Publication

Featured researches published by Hiroyuki Urano.

Archive | 2012

Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process

Daisuke Kori; Takeshi Kinsho; Katsuya Takemura; Tsutomu Ogihara; Takeru Watanabe; Hiroyuki Urano

Archive | 2012

Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film

Katsuya Takemura; Takashi Miyazaki; Hiroyuki Urano

Archive | 2015

Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film

Katsuya Takemura; Hiroyuki Urano; Masashi Iio; Takayuki Fujiwara; Koji Hasegawa

Archive | 2013

Silicone structure-bearing polymer, resin composition, and photo-curable dry film

Hiroyuki Urano; Katsuya Takemura; Takashi Miyazaki

Archive | 2014

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME

Jun Hatakeyama; Hiroyuki Urano; Masashi Iio

Archive | 2014

Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate

Hiroyuki Urano; Masashi Iio; Katsuya Takemura; Takashi Miyazaki

Archive | 2013

Thermal crosslinking accelerator, polysiloxane-containing resist underlayer film forming composition containing same, and patterning process using same

Tsutomu Ogihara; Yusuke Biyajima; Hiroyuki Urano

Archive | 2012

Chemically amplified negative resist composition, photo-curable dry film, manufacturing method thereof, pattern forming method, and electric/electronic part protecting film

Katsuya Takemura; 勝也 竹村; Takashi Miyazaki; 隆 宮崎; Hiroyuki Urano; 宏之 浦野

Archive | 2015

Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate

Hiroyuki Urano; Masashi Iio; Katsuya Takemura; Koji Hasegawa; Masahiro Fukushima; Takayuki Fujiwara

Archive | 2018

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM

Hiroyuki Urano; Katsuya Takemura; Masashi Iio; Koji Hasegawa; Kenji Funatsu

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Collaboration

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Katsuya Takemura

Panasonic

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Takashi Miyazaki

Shin-Etsu Chemical

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Masashi Iio

Shin-Etsu Chemical

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Koji Hasegawa

Shin-Etsu Chemical

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Takayuki Fujiwara

Shin-Etsu Chemical

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Masahiro Fukushima

Shin-Etsu Chemical

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Tsutomu Ogihara

Shin-Etsu Chemical

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Yusuke Biyajima

Shin-Etsu Chemical

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Daisuke Kori

Shin-Etsu Chemical

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Jun Hatakeyama

Shin-Etsu Chemical

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