Valerie Depauw

Photonic assisted light trapping integrated in ultrathin crystalline silicon solar cells by nanoimprint lithography

We report on the fabrication of two-dimensional periodic photonic nanostructures by nanoimprint lithography and dry etching and their integration into a 1-μm-thin mono-crystalline silicon solar cell. Thanks to the periodic nanopatterning, a better in-coupling and trapping of light is achieved, resulting in an absorption enhancement. The proposed light trapping mechanism can be explained as the superposition of a graded index effect and of the diffraction of light inside the photoactive layer. The absorption enhancement is translated into a 23% increase in short-circuit current, as compared to the benchmark cell, resulting in an increase in energy-conversion efficiency.

Design, fabrication and optical characterization of photonic crystal assisted thin film monocrystalline-silicon solar cells.

In this paper, we present the integration of an absorbing photonic crystal within a monocrystalline silicon thin film photovoltaic stack fabricated without epitaxy. Finite difference time domain optical simulations are performed in order to design one- and two-dimensional photonic crystals to assist crystalline silicon solar cells. The simulations show that the 1D and 2D patterned solar cell stacks would have an increased integrated absorption in the crystalline silicon layer would increase of respectively 38% and 50%, when compared to a similar but unpatterned stack, in the whole wavelength range between 300 nm and 1100 nm. In order to fabricate such patterned stacks, we developed an effective set of processes based on laser holographic lithography, reactive ion etching and inductively coupled plasma etching. Optical measurements performed on the patterned stacks highlight the significant absorption increase achieved in the whole wavelength range of interest, as expected by simulation. Moreover, we show that with this design, the angle of incidence has almost no influence on the absorption for angles as high as around 60°.

Large-Area Thin-Film Free-Standing Monocrystalline Si Solar Cells by Layer Transfer

This paper describes our progress achieved in thin-film free-standing monocrystalline silicon (FMS) solar cells by layer transfer process using porous silicon. The highest cell efficiency achieved for a 1times1 cm2 FMS solar cell is 13.5% with an open circuit voltage Voc=612 mV, current density Jsc =28.9 mA/cm2 and fill factor of FF=76.7%. In the effort of scaling-up of the cell area, the lift-off process was adapted to 10times10 cm2 substrates. The large-area epilayers from APCVD and LPCVD, respectively, were successfully processed into FMS solar cells, giving the best efficiency of 11.4% for the APCVD-FMS cell with an area of 11.1 cm2. Detailed study by quantum efficiency measurements, combined with SEM, revealed that the enhanced internal quantum efficiency and reflectance in the spectral range of lambda>825 nm for the APCVD-FMS cell can be attributed to the internal light reflection from the well-defined interface between the epilayer and the sintered porous, or quasi-monocrystalline silicon (QMS) layer

Large-area monocrystalline silicon thin films by annealing of macroporous arrays: Understanding and tackling defects in the material

A concept that could provide a thin monocrystalline-silicon absorber layer without resorting to the expensive step of epitaxy would be very appealing for reducing the cost of solar cells. The empty-space-in-silicon technique by which thin films of silicon can be formed by reorganization of regular arrays of cylindrical voids at high temperature may be such a concept if the high quality of the thin film could be ensured on centimeter-large areas. While previous works mainly investigated the influence of the porous array on the final structure, this work focuses on the practical aspects of the high-temperature step and its application to large areas. An insight into the defects that may form is given and the origin of these defects is discussed, providing recommendations on how to avoid them. Surface roughening, pitting, formation of holes, and silicon pillars could be attributed to the nonuniform reactions between Si, SiO2, and SiO. Hydrogen atmospheres are therefore preferred for reorganization of macropo...

Improving the Quality of Epitaxial Foils Produced Using a Porous Silicon-based Layer Transfer Process for High-Efficiency Thin-Film Crystalline Silicon Solar Cells

A porous silicon-based layer transfer process to produce thin (30-50 μm) kerfless epitaxial foils (epifoils) is a promising approach toward high-efficiency solar cells. For high efficiencies, the epifoil must have high minority carrier lifetimes. The epifoil quality depends on the properties of the porous layer since it is the template for epitaxy. It is shown that by reducing the thickness of this layer and/or its porosity in the near-surface region, the near-surface void size is reduced to <;65 nm and in certain cases achieve a 100 nm-thick void-free zone below the surface. Together with better void alignment, this allows for a smoother growth surface with a roughness of <;35 Å and reduced stress in the porous silicon. These improvements translate into significantly diminished epifoil crystal defect densities as low as ~420 defects/cm 2. Although epifoils on very thin porous silicon were not detachable, a significant improvement in the lifetime (diffusion length) of safely detachable n-type epifoils from ~85 (~300 μm) to ~195 μs (~470 μm) at the injection level of 10 15/cm 3 is achieved by tuning the porous silicon template. Lifetimes exceeding ~350 μs have been achieved in the reference lithography-based epifoils, showing the potential for improvement in porous silicon-based epifoils.

Micrometer-Thin Crystalline-Silicon Solar Cells Integrating Numerically Optimized 2-D Photonic Crystals

A 2-D photonic crystal was integrated experimentally into a thin-film crystalline-silicon solar cell of 1-μm thickness, after numerical optimization maximizing light absorption in the active material. The photonic crystal boosted the short-circuit current of the cell, but it also damaged its open-circuit voltage and fill factor, which led to an overall decrease in performances. Comparisons between modeled and actual optical behaviors of the cell, and between ideal and actual morphologies, show the global robustness of the nanostructure to experimental deviations, but its particular sensitivity to the conformality of the top coatings and the spread in pattern dimensions, which should not be neglected in the optical model. As for the electrical behavior, the measured internal quantum efficiency shows the strong parasitic absorptions from the transparent conductive oxide and from the back-reflector, as well as the negative impact of the nanopattern on surface passivation. Our exemplifying case, thus, illustrates and experimentally confirms two recommendations for future integration of surface nanostructures for light trapping purposes: 1) the necessity to optimize absorption not for the total stack but for the single active material, and 2) the necessity to avoid damage to the active material by pattern etching.

Influence of the pattern shape on the efficiency of front-side periodically patterned ultrathin crystalline silicon solar cells

Patterning the front side of an ultrathin crystalline silicon (c-Si) solar cell helps keeping the energy conversion efficiency high by compensating for the light absorption losses. A super-Gaussian mathematical expression was used in order to encompass a large variety of nanopattern shapes and to study their influence on the optical performance. We prove that the enhancement in the maximum achievable photo-current is due to both impedance matching condition at short wavelengths and to the wave nature of light at longer wavelengths. We show that the optimal mathematical shape and parameters of the pattern depend on the c-Si thickness. An optimal shape comes with a broad optimal parameter zone where experimental inaccuracies have much less influence on the efficiency. We prove that cylinders are not the best suited shape. To compare our model with a real slab, we fabricated a nanopatterned c-Si slab via nano imprint lithography.

Disordered nanostructures by hole-mask colloidal lithography for advanced light trapping in silicon solar cells

We report on the fabrication of disordered nanostructures by combining colloidal lithography and silicon etching. We show good control of the short-range ordered colloidal pattern for a wide range of bead sizes from 170 to 850 nm. The inter-particle spacing follows a Gaussian distribution with the average distance between two neighboring beads (center to center) being approximately twice their diameter, thus enabling the nanopatterning with dimensions relevant to the light wavelength scale. The disordered nanostructures result in a lower integrated reflectance (8.1%) than state-of-the-art random pyramid texturing (11.7%) when fabricated on 700 µm thick wafers. When integrated in a 1.1 µm thin crystalline silicon slab, the absorption is enhanced from 24.0% up to 64.3%. The broadening of resonant modes present for the disordered nanopattern offers a more broadband light confinement compared to a periodic nanopattern. Owing to its simplicity, versatility and the degrees of freedom it offers, this potentially low-cost bottom-up nanopatterning process opens perspectives towards the integration of advanced light-trapping schemes in thin solar cells.

High-quality epitaxial foils, obtained by a layer transfer process, for integration in back-contacted solar cells processed on glass

Foil creation by lifting off a thin layer of a high quality silicon substrate is one of the promising substitutes for wafer sawing to create substrates thinner than 100 μm. The porous silicon-based layer transfer process is a well known method to obtain high quality foils. Despite a number of convincing lab-based solar cell show-cases, there is no breakthrough of this technology at (semi)-industrial level, because of the poor yield of processing free standing foils. This paper presents a method to fabricate back contacted solar cells based on epitaxial foils avoiding processes on free-standing foils. First, a porous silicon layer is electrochemically etched, acting as a weak sacrificial layer to detach the foil that is epitaxially grown on top of the porous silicon layer. Characterization of the epitaxial foils shows a good crystalline quality and an effective lifetime around 100 μs. Those results give indications that the obtained foils are well suited for solar cell fabrication. Front-side processing is done while the epitaxial foil is still attached to its parent substrate. A good yield is obtained for epitaxial foils that underwent the front-side processing sequence consisting of wet chemical texturing, FSF formation, passivation and ARC deposition. Afterwards, the front-side of the foil is bonded to a glass carrier and the foil is detached from its parent substrate. Silicone adhesives are used for this permanent bond. The rear-side of the solar cell is processed while bonded to glass. Therefore, only low temperature processes (<;200°C) can be used. So far, the rear-side processing sequence was performed on Float-zone reference wafers as a proof of concept resulting in a confirmed maximum efficiency of 18.4%. The rear-side processing sequence still needs to be applied on epitaxial foils.

Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

Sintered porous silicon is a well-known seed for homo-epitaxy that enables fabricating transferrable monocrystalline foils. The crystalline quality of these foils depends on the surface roughness and the strain of this porous seed, which should both be minimized. In order to provide guidelines for an optimum foil growth, we present a systematic investigation of the impact of the thickness of this seed and of its sintering time prior to epitaxial growth on strain and surface roughness. Strain and surface roughness were monitored in monolayers and double layers with different porosities as a function of seed thickness and of sintering time by high-resolution X-ray diffraction and profilometry, respectively. Unexpectedly, we found that strain in double and monolayers evolves in opposite ways with respect to layer thickness. This suggests that an interaction between layers in multiple stacks is to be considered. We also found that if higher seed thickness and longer annealing time are to be preferred to minimize the strain in double layers, the opposite is required to achieve smoother layers. The impact of these two parameters may be explained by considering the morphological evolution of the pores upon sintering and, in particular, the disappearance of interconnections between the porous seed and the bulk as well as the enlargement of pores near the surface. An optimum epitaxial growth hence calls for a trade-off in seed thickness and annealing time, between minimum-strained layers and rougher surfaces.PACS codes81.40.-z Treatment of materials and its effects on microstructure, nanostructure, and properties; 81.05.Rm Porous materials; granular materials; 82.80.Ej X-ray, Mössbauer and other γ-ray spectroscopic analysis methods