Vincent Gouin

A new design-for-test technique for SRAM core-cell stability faults

Core-cell stability represents the ability of the core-cell to keep the stored data. With the rapid development of semiconductor memories, their test is becoming a major concern in VDSM technologies. It provides information about the SRAM design reliability, and its effectiveness is therefore mandatory for safety applications. Existing core-cell stability design-for-test (DfT) techniques consist in controlling the voltage levels of bit lines to apply a weak write stress on the core-cell under test. If the core-cell is weak, the weak write stress induces the faulty swap of the core-cell. However, these solutions are costly in terms of area and test application time, and generally require modifications of critical parts of the SRAM (core-cell array and/or the structure generating the internal auto-timing). In this paper, we present a new DfT technique for stability fault detection. It consists in modulating the word line activation in order to perform an adjustable weak write stress on the targeted core-cell for stability fault detection. Compared to existing DfT solutions, the proposed technique offers many advantages: programmability, low area overhead, low test application time. Moreover, it does not require any modification of critical parts of the SRAM.

A design-for-diagnosis technique for SRAM write drivers

Diagnosis is becoming a major concern with the rapid development of semiconductor memories. It provides information about the location of manufacturing defects in the memory, and its effectiveness allows a fast yield ramp up. Most of existing diagnosis methods uses a fault dictionary to provide detailed information of fault localization. However, these solutions are most of the time unable to distinguish between all faults, and more importantly often fail to identify the actual faulty block of the memory. Identifying which block of a memory (core- cell array, write drivers, address decoders, pre-charge circuits, etc ...) is defective allows saving considerable amount of time during the ramp up phase. In this paper, we propose a very low cost design-for-diagnosis (DfD) solution for identifying faulty write drivers. It consists in verifying logic and analog conditions that guarantee the fault-free behavior of the write driver. The proposed solution allows a fast diagnosis (only three consecutive write operations are needed to fully diagnose the write driver) and induces a low area overhead (about 0.5% for a 512 times 512 SRAM). Beside diagnosis, an additional interest of such a solution is its usefulness during a post-silicon characterization process, where it can be used to extract the main features of write drivers (logic and analog levels on bit lines).

An SRAM Design-for-Diagnosis Solution Based on Write Driver Voltage Sensing

Diagnosis is becoming a major concern with the rapid development of semiconductor memories. It provides information about the location of manufacturing defects in the memory, and its effectiveness allows a fast yield ramp up. Most of existing diagnosis methods uses a fault dictionary to provide detailed information on fault localization. However, these solutions are most of the time unable to distinguish between all faults, and more importantly often fail to identify the actual faulty block of the memory. Identifying which block of a memory (core- cell array, write drivers, address decoders, pre-charge circuits, etc ...) is defective allows to saving considerable amount of time during the ramp up phase. In this paper, we propose a very low cost design-for- diagnosis (DfD) solution for identifying faulty write drivers. It consists in verifying logic and analog conditions that guarantee the fault-free behavior of the write driver. The proposed solution allows a fast diagnosis (only three consecutive write operations are needed to fully diagnose the write driver) and induces a low area overhead (about 0.5% for a 512 times 512 SRAM). Beside diagnosis, an additional interest of such a solution is its usefulness during a post-silicon characterization process, where it can be used to extract the main features of the write drivers (logic and analog levels on bit lines).

Influence of Threshold Voltage Deviations on 90nm SRAM Core-Cell Behavior

Nanoscaled SRAMs are now becoming more and more prone to device parameter deviations. In this paper, we consider threshold voltage (Vt) deviations in 6T core-cells designed with 90 nm technology. Static faults (transition and read destructive) but also dynamic faults (dynamic read destructive) are obtained as resulting faulty behaviors. Moreover, electrical data show that PVT (process, voltage, temperature) corners that maximize the detection of these faults are quite unconventional. Especially, we show that Vt deviations have their main impact at low voltage while hard defects, such as resistive-open defects in the core-cell, better manifest themselves at high voltage. This study of parameter deviations opens an additional problematic for the test of nanoscaled SRAMS that will be much more severe in deeper technologies (65 nm and 45 nm).