W Breilmann

Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium

High power impulse magnetron sputtering (HiPIMS) plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering (dcMS). The origin of these very energetic ions in HiPIMS is still an open issue, which is unravelled using two fast diagnostics: time-resolved mass spectrometry with a temporal resolution of 2 µs and phase resolved optical emission spectroscopy with a temporal resolution of 1 µs. A power scan from dcMS-like to HiPIMS plasmas was performed, with a 2 inch magnetron and a titanium target as sputter source and argon as working gas. Clear differences in the transport as well as the energetic properties of Ar + ,A r 2+ ,T i + and Ti 2+ were observed. For discharges with highest peak power densities a high energetic group of Ti + and Ti 2+ could be identified with energies of approximately 25 eV and of 50 eV, respectively. A cold group of ions was always present. It is found that hot ions are observed only when the plasma enters the spokes regime, which can be monitored by oscillations in the IV characteristics in the MHz range that are picked up by the used VI probes. These oscillations are correlated with the spokes phenomenon and are explained as an amplification of the Hall current inside the spokes as hot ionization zones. To explain the presence of energetic ions, we propose a double layer (DL) confining the hot plasma inside a spoke: if an atom becomes ionized inside the spokes region it is accelerated because of the DL to higher energies whereas its energy remains unchanged if it is ionized outside. In applying this DL model to our measurements the observed phenomena as well as several measurements from other groups can be explained. Only if spokes and a DL are present can the confined particles gain enough energy to leave the magnetic trap. We conclude from our findings that the spoke phenomenon represents the essence of HiPIMS plasmas, explaining their good performance for material synthesis applications.

High power impulse sputtering of chromium: correlation between the energy distribution of chromium ions and spoke formation

High power magnetron sputtering (HiPIMS) discharges generate ions with high kinetic energies in comparison to conventional dc magnetron sputtering. The peculiar shape of the ion energy distribution function (IEDF) is correlated to the formation of localized ionization zones (IZ) in the racetrack of a HiPIMS discharge, so called spokes. This is explained by a local maximum of the electrical potential inside these localized IZ. By using ion energy mass spectrometry, probe experiments and plasma spectroscopy the connection between IZ and IEDFs is evaluated with high temporal resolution. The data of a floating probe next to the target is used to directly monitor the movement of the spokes in the direction. Chromium is used as target material, because the plasma undergoes a sequence from stochastic spoke formation, to regular spoke pattern rotating in the direction to a homogeneous plasma torus with increasing plasma power. In particular, the analysis of the transition from the regular spoke pattern to the homogeneous plasma torus at very high plasma powers shows that the high energy part of the IEDF is not affected and only the low energy part is modified. Consequently, one could consider the homogenous plasma torus at very high plasma powers as a a single ionization zone localized over the complete torus, which is formed by merging individual spokes with increasing power. Details and consequences of that model are discussed.

Investigation of plasma spokes in reactive high power impulse magnetron sputtering discharge

Spokes, localised ionisation zones, are commonly observed in magnetron sputtering plasmas, appearing either with a triangular shape or with a diffuse shape, exhibiting self-organisation patterns. In this paper, we investigate the spoke properties (shape and emission) in a high power impulse magnetron sputtering (HiPIMS) discharge when reactive gas (N2 or O2) is added to the Ar gas, for three target materials; Al, Cr, and Ti. Peak discharge current and total pressure were kept constant, and the discharge voltage and mass flow ratios of Ar and the reactive gas were adjusted. The variation of the discharge voltage is used as an indication of a change of the secondary electron yield. The optical emission spectroscopy data demonstrate that by addition of reactive gas, the HiPIMS plasma exhibits a transition from a metal dominated plasma to the plasma dominated by Ar ions and, at high reactive gas partial pressures, to the plasma dominated by reactive gas ions. For all investigated materials, the spoke shape changed to the diffuse spoke shape in the poisoned mode. The change from the metal to the reactive gas dominated plasma and increase in the secondary electron production observed as the decrease of the discharge voltage corroborate our model of the spoke, where the diffuse spoke appears when the plasma is dominated by species capable of generating secondary electrons from the target. Behaviour of the discharge voltage and maximum plasma emission is strongly dependant on the target/reactive gas combination and does not fully match the behaviour observed in DC magnetron sputtering.Spokes, localised ionisation zones, are commonly observed in magnetron sputtering plasmas, appearing either with a triangular shape or with a diffuse shape, exhibiting self-organisation patterns. In this paper, we investigate the spoke properties (shape and emission) in a high power impulse magnetron sputtering (HiPIMS) discharge when reactive gas (N2 or O2) is added to the Ar gas, for three target materials; Al, Cr, and Ti. Peak discharge current and total pressure were kept constant, and the discharge voltage and mass flow ratios of Ar and the reactive gas were adjusted. The variation of the discharge voltage is used as an indication of a change of the secondary electron yield. The optical emission spectroscopy data demonstrate that by addition of reactive gas, the HiPIMS plasma exhibits a transition from a metal dominated plasma to the plasma dominated by Ar ions and, at high reac...

Fast Time Resolved Techniques as Key to the Understanding of Energy and Particle Transport in HPPMS-Plasmas

High-power pulsed magnetron sputtering (HPPMS) plasmas are pulsed discharges, where the plasma composition as well as the fluxes and energies of ions are changing during the pulse. The time resolved energy distribution for Ar1+ ions was measured and phase resolved optical emission spectroscopy for the Ar I line at 760 nm was done to get more insight in the transport properties of the plasma forming noble gas. These measurements were performed during HPPMS of titanium with argon at 0.5 Pa. The peak power density during the 50-μs pulses was 1.8 kW/cm2. In this contribution, we demonstrate how time resolved mass spectrometry and Intensified Charge-Coupled Device, Intensified CCD cameras can be used to shed more light on energy and particle transport in HPPMS-plasmas.